E-LIB Suche - Ergebnisse für: Ju, Yun Hee

1

UV‐Curable Adhesive Tape‐Assisted Patterning of Metal Nanow..:

Ju, Yun Hee ; Han, Chul Jong ; Kim, Kwang‐Seok.
Advanced Materials Technologies. 6 (2021) 12 - p. , 2021

Link: https://doi.org/10.1002/..

2

Modified Inverted Layer Processing of Ultrathin Touch Senso..:

Shin, Yoo Bin ; Ju, Yun Hee ; Seo, In-Seok...
Electronic Materials Letters. 16 (2020) 3 - p. 247-254 , 2020

Link: https://doi.org/10.1007/..

3

Pressure-Sensitive Adhesive with Controllable Adhesion for ..:

Ju, Yun Hee ; Lee, Hee-Jin ; Han, Chul Jong...
ACS Applied Materials & Interfaces. 12 (2020) 36 - p. 40794-40801 , 2020

Link: https://doi.org/10.1021/..

4

Water-responsive pressure-sensitive adhesive with reversibl..:

Ju, Yun Hee ; Lee, Hee-Jin ; Han, Chul Jong...
Materials & Design. 195 (2020) - p. 108995 , 2020

Link: https://doi.org/10.1016/..

5

Self-Integratable, Healable, and Stretchable Electrolumines..:

Shin, Yoo Bin ; Ju, Yun Hee ; Lee, Hee-Jin...
ACS Applied Materials & Interfaces. 12 (2020) 9 - p. 10949-10958 , 2020

Link: https://doi.org/10.1021/..

6

A UV-responsive pressure sensitive adhesive for damage-free..:

Kim, Sang-Woo ; Ju, Yun Hee ; Han, Sangmoon...
Journal of Materials Chemistry A. 7 (2019) 39 - p. 22588-22595 , 2019

Link: https://doi.org/10.1039/..

7

AlGaN-based ternary nitride memristors:

Choi, Seok ; Lee, Ha Young ; Yun, Hee Ju.
Applied Physics A. 127 (2021) 9 - p. , 2021

Link: https://doi.org/10.1007/..

8

Growth of Al-rich AlGaN thin films by purely thermal atomic..:

Choi, Seok ; Ansari, Abu Saad ; Yun, Hee Ju...
Journal of Alloys and Compounds. 854 (2021) - p. 157186 , 2021

Link: https://doi.org/10.1016/..

9

Multilevel operation of GdOx-based resistive switching memo..:

Yun, Hee Ju ; Ryu, Sung Yeon ; Lee, Ha Young...
Ceramics International. 47 (2021) 12 - p. 16597-16602 , 2021

Link: https://doi.org/10.1016/..

10

Comparison of electrical and interfacial characteristics be..:

Kim, Hogyoung ; Yun, Hee Ju ; Choi, Seok.
Applied Physics A. 126 (2020) 6 - p. , 2020

Link: https://doi.org/10.1007/..

11

Nucleation and growth behavior of aluminum nitride film usi..:

Yun, Hee Ju ; Kim, Hogyoung ; Choi, Byung Joon
Ceramics International. 46 (2020) 9 - p. 13372-13376 , 2020

Link: https://doi.org/10.1016/..

12

Atomic Layer Deposition of AlN Thin Films on GaN and Electr..:

Kim, Hogyoung ; Yun, Hee Ju ; Choi, Seok.
Transactions on Electrical and Electronic Materials. 21 (2020) 6 - p. 621-629 , 2020

Link: https://doi.org/10.1007/..

13

Interfacial and electrical properties of nanolaminated HfO2..:

Kim, Hogyoung ; Yun, Hee Ju ; Choi, Seok.
Semiconductor Science and Technology. 35 (2019) 1 - p. 015012 , 2019

Link: https://doi.org/10.1088/..

14

Investigation of fast and slow traps in atomic layer deposi..:

Kim, Hogyoung ; Yun, Hee Ju ; Choi, Byung Joon
Optik. 184 (2019) - p. 527-532 , 2019

Link: https://doi.org/10.1016/..

15

Effects of moisture and electrode material on AlN-based res..:

Yun, Hee Ju ; Choi, Byung Joon
Ceramics International. 45 (2019) 13 - p. 16311-16316 , 2019

Link: https://doi.org/10.1016/..