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Kim, Woo-Hee
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1

Atomic layer deposited RuO2 with controlled crystallinity a..:

Lee, Jaehwan ; Lee, Sanghun ; Kim, Youngjun...
Vacuum.  220 (2024)  - p. 112843 , 2024
Link: https://doi.org/10.1016/..
 
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2

Enhanced Deposition Selectivity of High-k Dielectrics by Va..:

Lee, Jeong-Min ; Lee, Seo-Hyun ; Lee, Ji Hun...
ACS Applied Materials & Interfaces.  16 (2024)  28 - p. 37157-37166 , 2024
Link: https://doi.org/10.1021/..
 
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3

Highly area-selective atomic layer deposition of device-qua..:

Kim, Hyo-Bae ; Lee, Jeong-Min ; Sung, Dougyong..
Chemical Engineering Journal.  488 (2024)  - p. 150760 , 2024
Link: https://doi.org/10.1016/..
 
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4

Selective nitride passivation using vapor-dosed aldehyde in..:

Park, Haneul ; Oh, Jieun ; Lee, Jeong-Min.
Materials Letters.  366 (2024)  - p. 136570 , 2024
Link: https://doi.org/10.1016/..
 
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5

Area-selective atomic layer deposition of Ru thin films by ..:

Lee, Jinseon ; Oh, Jieun ; Kim, Jiwon...
Applied Surface Science.  662 (2024)  - p. 160099 , 2024
Link: https://doi.org/10.1016/..
 
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6

Dysprosium Incorporation for Phase Stabilization of Atomic-..:

Lee, Yujin ; Kim, Kangsik ; Lee, Zonghoon...
Chemistry of Materials.  , 2023
Link: https://doi.org/10.1021/..
 
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7

High-quality SiNx thin-film growth at 300 °C using atomic l..:

Park, Jae Chan ; Kim, Dae Hyun ; Seok, Tae Jun...
Journal of Materials Chemistry C.  11 (2023)  27 - p. 9107-9113 , 2023
Link: https://doi.org/10.1039/..
 
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8

Advanced atomic layer deposition (ALD): controlling the rea..:

Han, Ji Won ; Jin, Hyun Soo ; Kim, Yoon Jeong...
Journal of Materials Chemistry C.  11 (2023)  11 - p. 3743-3750 , 2023
Link: https://doi.org/10.1039/..
 
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9

Correction to "Dysprosium Incorporation for Phase Stabiliza..:

Lee, Yujin ; Kim, Kangsik ; Lee, Zonghoon...
Chemistry of Materials.  , 2023
Link: https://doi.org/10.1021/..
 
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10

Area-Selective Atomic Layer Deposition of Ruthenium Thin Fi..:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
Lee, Jeong-Min ; Kim, Woo-Hee - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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11

Area-selective atomic layer deposition of high-quality Ru t..:

Lee, Jeong-Min ; Lee, Seo-Hyun ; Oh, Jieun.
Materials Letters.  333 (2023)  - p. 133574 , 2023
Link: https://doi.org/10.1016/..
 
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12

Area-Selective Atomic Layer Deposition of Ruthenium Thin Fi..:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
Park, Haneul ; Oh, Jieun ; Lee, Jeong-Min. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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13

Chemical mechanism of oxidative etching of ruthenium: Insig..:

Yu, Neung-Kyung ; Lee, Jeong-Min ; Kim, Woo-Hee.
Applied Surface Science.  636 (2023)  - p. 157864 , 2023
Link: https://doi.org/10.1016/..
 
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14

Advanced atomic layer deposition: metal oxide thin film gro..:

Park, Jae Chan ; Choi, Chang Ik ; Lee, Sang-Gil...
Journal of Materials Chemistry C.  11 (2023)  4 - p. 1298-1303 , 2023
Link: https://doi.org/10.1039/..
 
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15

Advanced Atomic Layer Deposition: Ultrathin and Continuous ..:

Han, Ji Won ; Jin, Hyun Soo ; Kim, Yoon Jeong...
Nano Letters.  22 (2022)  11 - p. 4589-4595 , 2022
Link: https://doi.org/10.1021/..
 
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