Kwakman, J.A.
263  results:
Search for persons X
?
 
?
2

Surface contamination and electrical damage by focused ion ..:

Bender, H ; Franquet, A ; Drijbooms, C...
Semiconductor Science and Technology.  30 (2015)  11 - p. 114015 , 2015
 
?
3

Xe+ FIB Milling and Measurement of Amorphous Silicon Damage:

Kelley, R.D. ; Song, K. ; Van Leer, B...
Microscopy and Microanalysis.  19 (2013)  S2 - p. 862-863 , 2013
 
?
4

A Comparison of Xenon Plasma FIB Technology with Convention..:

Young, R ; Rue, C ; Randolph, S...
Microscopy and Microanalysis.  17 (2011)  S2 - p. 652-653 , 2011
 
?
5

X-ray metrology for advanced silicon processes:

Wyon, C. ; Gonchond, J.P. ; Delille, D....
Applied Surface Science.  253 (2006)  1 - p. 21-27 , 2006
 
?
7

European 300 mm metrology platform — MEDEA T618:

Trilhe, J ; Reader, A ; Kwakman, L
Microelectronic Engineering.  56 (2001)  1-2 - p. 15-25 , 2001
 
?
8

Vertical distraction of the extremely resorbed edentulous m..:

Voorsmit, R. ; Vujovic, B. ; Kwakman, J.
International Journal of Oral and Maxillofacial Surgery.  28 (1999)  - p. 83 , 1999
 
?
9

Berichte:

Reichel, Georg ; Balleer, Martin ; Storck, Hans...
Blätter der DGVFM.  10 (1972)  4 - p. 561-577 , 1972
 
?
12

Exploring the predictive potential of programmed death liga..:

Miedema, Iris H C ; Pouw, Johanna E. E. ; Kwakman, Anne...
Journal for ImmunoTherapy of Cancer.  12 (2024)  6 - p. e008899 , 2024
 
?
 
1-15