E-LIB Suche - Ergebnisse für: Kwon, Kwang Ho

1

Fast-speed, high-sensitivity polyimide humidity sensors wit..:

Lee, Myung Jin ; Hong, Hyun Pyo ; Kwon, Kwang Ho..
Sensors and Actuators B: Chemical. 185 (2013) - p. 97-104 , 2013

2

Statistical Characterization of Process-Induced Plasma Dama..:

Kim, Byungwhan ; Kwon, Sang Hee ; Kwon, Kwang Ho...
Materials and Manufacturing Processes. 24 (2009) 6 - p. 610-614 , 2009

Link: https://doi.org/10.1080/..

3

Neural network characterization of plasma-induced charging ..:

Kim, Byungwhan ; Kwon, Sang Hee ; Kwon, Kwang Ho...
Journal of Applied Physics. 105 (2009) 11 - p. , 2009

Link: https://doi.org/10.1063/..

4

Prediction of etch microtrenching using a neural network:

Kim, Byungwhan ; Lee, Duk Woo ; Kwon, Kwang Ho
Journal of Applied Physics. 96 (2004) 7 - p. 3612-3616 , 2004

Link: https://doi.org/10.1063/..

5

Qualitative modeling of silica plasma etching using neural ..:

Kim, Byungwhan ; Kwon, Kwang Ho
Journal of Applied Physics. 93 (2003) 1 - p. 76-82 , 2003

Link: https://doi.org/10.1063/..

6

Etiologies of Bacterial Pneumonia with Implications for The..:

Woo, Junhee ; Lee, Jae Seok ; Kwon, Kwang Ho...
Tuberculosis and Respiratory Diseases. 42 (1995) 1 - p. 67 , 1995

Link: https://doi.org/10.4046/..

7

On Relationships between Plasma Chemistry and Surface React..:

Baek, Seung Yong ; Efremov, Alexander ; Bobylev, Alexander..
Materials. 16 (2023) 14 - p. 5043 , 2023

Link: https://doi.org/10.3390/..

8

Individual Effects of Various Plasma-Related Factors on the..:

Son, Hye Jun ; Efremov, Alexander ; Choi, Gilyoung.
Plasma Chemistry and Plasma Processing. 44 (2023) 1 - p. 635-649 , 2023

Link: https://doi.org/10.1007/..

9

On mechanisms to control SiO2 etching kinetics in low-power..:

Choi, Gilyoung ; Efremov, Alexander ; Lee, Dae-Kug..
Vacuum. 216 (2023) - p. 112484 , 2023

Link: https://doi.org/10.1016/..

10

On mechanisms influencing etching/polymerization balance in..:

Efremov, Alexander ; Son, Hye Jun ; Choi, Gilyoung.
Vacuum. 206 (2022) - p. 111518 , 2022

Link: https://doi.org/10.1016/..

11

Etching kinetics and dielectric properties of SiOC films ex..:

Oh, Younghun ; Efremov, Alexander ; Lee, Junmyung...
Thin Solid Films. 749 (2022) - p. 139185 , 2022

Link: https://doi.org/10.1016/..

12

Dry Etching Performance and Gas-Phase Parameters of C6F12O ..:

Lim, Nomin ; Choi, Yeon Sik ; Efremov, Alexander.
Materials. 14 (2021) 7 - p. 1595 , 2021

Link: https://doi.org/10.3390/..

13

A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coup..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Plasma Chemistry and Plasma Processing. 41 (2021) 6 - p. 1671-1689 , 2021

Link: https://doi.org/10.1007/..

14

On Relationships between Gas-Phase Chemistry and Reactive I..:

Efremov, Alexander ; Lee, Byung Jun ; Kwon, Kwang-Ho
Materials. 14 (2021) 6 - p. 1432 , 2021

Link: https://doi.org/10.3390/..

15

Comparative study of Cl2 + O2 and HBr + O2 plasma chemistri..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Vacuum. 186 (2021) - p. 110043 , 2021

Link: https://doi.org/10.1016/..