Lee, Min-Hung
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5

Performance Evaluation of AFeRAM under Low Temperature Oper..:

, In: 2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM),
 
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6

Ferroelectric Engineering of FeFET Toward Multi-Level Codin..:

, In: 2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT),
Lee, Min-Hung - p. 1-1 , 2023
 
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7

NLS based Modeling of Temperature-dependent Phase Transitio..:

, In: 2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT),
 
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8

Multi-Layer Chips on Wafer Stacking Technologies with Carbo..:

, In: 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC),
Liao, Bo-Zhou ; Chen, Liang-Hsi ; Chen, Kai-Cheng... - p. 1811-1817 , 2022
 
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10

Monte-Carlo Modeling and Characterization of Switching Dyna..:

, In: 2022 International Electron Devices Meeting (IEDM),
Chen, Yu-Chen ; Hsiang, Kuo-Yu ; Lee, Min-Hung. - p. 13.4.1-13.4.4 , 2022
 
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11

Improving Edge Dead Domain and Endurance in Scaled HfZrOx F..:

, In: 2021 IEEE International Electron Devices Meeting (IEDM),
Lin, Yu-De ; Yeh, Po-Chun ; Tang, Ying-Tsan... - p. 6.4.1-6.4.4 , 2021
 
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Visualizing Ferroelectric Uniformity of Hf1–xZrxO2 Films Us..:

Chang, Shu-Jui ; Teng, Chih-Yu ; Lin, Yi-Jan...
ACS Applied Materials & Interfaces.  13 (2021)  24 - p. 29212-29221 , 2021
 
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14

NLS based Modeling and Characterization of Switching Dynami..:

, In: 2021 IEEE International Electron Devices Meeting (IEDM),
Chen, Yu-Chen ; Hsiang, Kuo-Yu ; Tang, Ying-Tsan.. - p. 15.4.1-15.4.4 , 2021
 
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15

Ferroelectric HfZrO₂ FETs for Emerging Technologies:

, In: 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),
Lee, Min-Hung - p. 148-148 , 2020
 
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