E-LIB Suche - Ergebnisse für: Lee, Nae-In

1

Impact of thermal oxidation pressure and temperature on dea..:

Lim, Hajin ; Kim, Seongkyung ; Kim, Joon Rae...
physica status solidi (a). 212 (2015) 9 - p. 1911-1915 , 2015

Link: https://doi.org/10.1002/..

2

Thickness and Post-annealing Effects of the Sputtered La-Ca..:

Kim, Woo-Hee ; Lee, Nae-In ; Lee, Jong-Ho.
ACS Applied Materials & Interfaces. 6 (2014) 7 - p. 5199-5205 , 2014

Link: https://doi.org/10.1021/..

3

Reduction in the Interfacial Trap Density of Al2O3/GaAs Gat..:

Lim, Hajin ; Kim, Seongkyung ; Kim, Joon Rae...
ECS Journal of Solid State Science and Technology. 3 (2014) 12 - p. Q232-Q235 , 2014

Link: https://doi.org/10.1149/..

4

Properties of Atomic Layer Deposited HfO2Films on Ge Substr..:

Jung, Hyung-Suk ; Kim, Hyo Kyeom ; Yu, Il-Hyuk...
Journal of The Electrochemical Society. 159 (2012) 4 - p. G33-G39 , 2012

Link: https://doi.org/10.1149/..

5

The Impact of Carbon Concentration on the Crystalline Phase..:

Jung, Hyung-Suk ; Jeon, Sang Ho ; Kim, Hyo Kyeom...
ECS Journal of Solid State Science and Technology. 1 (2012) 2 - p. N33-N37 , 2012

Link: https://doi.org/10.1149/..

6

Effect of Catalyst Layer Density and Growth Temperature in ..:

Won, Seok-Jun ; Kim, Joon Rae ; Suh, Sungin...
ACS Applied Materials & Interfaces. 3 (2011) 5 - p. 1633-1639 , 2011

Link: https://doi.org/10.1021/..

7

The Effect of Nitrogen in HfOxNy and ZrOxNy on Dielectric P..:

Jung, Hyung-Suk ; Kim, Hyo Kyeom ; Kim, Jeong Hwan...
ECS Transactions. 33 (2010) 3 - p. 521-526 , 2010

Link: https://doi.org/10.1149/..

8

The Bias Temperature Instability Characteristics of In Situ..:

Jung, Hyung-Suk ; Park, Jung-Min ; Kim, Hyo Kyeom...
Electrochemical and Solid-State Letters. 13 (2010) 9 - p. G71 , 2010

Link: https://doi.org/10.1149/..

9

Systematic study on bias temperature instability of various..:

, In: 2009 IEEE International Reliability Physics Symposium,

Jung, Hyung-Suk ; Park, Tae Joo ; Kim, Jeong Hwan... - p. None , 2009

Link: https://doi.org/10.1109/..

10

Thermal stability and decomposition of the HfO2–Al2O3 lamin..:

Chang, Hyo Sik ; Hwang, Hyunsang ; Cho, Mann-Ho...
Applied Physics Letters. 84 (2004) 1 - p. 28-30 , 2004

Link: https://doi.org/10.1063/..

11

Comparison of HfO2 films grown by atomic layer deposition u..:

Park, Hong Bae ; Cho, Moonju ; Park, Jaehoo...
Journal of Applied Physics. 94 (2003) 5 - p. 3641-3647 , 2003

Link: https://doi.org/10.1063/..

12

Investigation of interface trap states in TiN/Al2O3/p-Si ca..:

Jeon, In Sang ; Park, Jaehoo ; Eom, Dail...
Applied Physics Letters. 82 (2003) 7 - p. 1066-1068 , 2003

Link: https://doi.org/10.1063/..

13

Post-Annealing Effects on Fixed Charge and Slow/Fast Interf..:

Jeon, In Sang ; Park, Jaehoo ; Eom, Dail...
Japanese Journal of Applied Physics. 42 (2003) Part 1, No. 3 - p. 1222-1226 , 2003

Link: https://doi.org/10.1143/..

14

Highly reliable ECR N2O-plasma polyoxide grown on heavily p..:

Lee, Nae-in ; Lee, Jin-Woo ; Han, Chul-Hi
Journal of Electronic Materials. 28 (1999) 12 - p. L31-L33 , 1999

Link: https://doi.org/10.1007/..

15

Endurance Characteristics and Degradation Mechanism ofPolys..:

Lee, Nae-In ; Lee, Jin-Woo ; Han, andChul-Hi
Japanese Journal of Applied Physics. 38 (1999) 4S - p. 2215 , 1999

Link: https://doi.org/10.1143/..