Li, Tomi-T.
563  results:
Search for persons X
?
3

Intramolecular electron transfer at metal surfaces. Part V...:

Li, Tomi T.-T. ; Weaver, Michael J.
Journal of Electroanalytical Chemistry and Interfacial Electrochemistry.  188 (1985)  1-2 - p. 121-129 , 1985
 
?
5

A Machine Learning Study to Obtain an Optimal Processing Pu..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
 
?
6

Wire-arc spray directed energy deposition: Correlation of c..:

Yang, Shang-Shian ; Lai, Hong-Lin ; Chen, Chih-Chia...
Journal of Materials Research and Technology.  30 (2024)  - p. 2754-2767 , 2024
 
?
9

A multi-step deposited AlN films in a DC pulsed sputtering ..:

Chen, Wei-Lun ; Zhou, Wei-Yu ; Yuan, Ning-Hsiu...
The International Journal of Advanced Manufacturing Technology.  127 (2023)  5-6 - p. 2955-2967 , 2023
 
?
10

Predicting residual stress of aluminum nitride thin-film by..:

Chen, Hsuan-Fan ; Yang, Yu-Pu ; Chen, Wei-Lun...
Materials Chemistry and Physics.  295 (2023)  - p. 127070 , 2023
 
?
11

Pulsed DC Parameters (Reverse Voltage, Duty Cycle, Pulsed F..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Zhou, Wei-Yu ; Tseng, Xue-Li ; Yuan, Ning-Hsiu... - p. 1-6 , 2023
 
?
12

A hybrid sensor for motor tics recognition based on piezoel..:

Wang, Jie ; Chen, Chih Chia ; Shie, Chin Yau..
Sensors and Actuators A: Physical.  342 (2022)  - p. 113622 , 2022
 
?
13

A novel dry processing technique to construct a high-perfor..:

Huang, Huei Chen ; Ho, Chia Che ; Fuh, Yiin-kuen.
Journal of Manufacturing Processes.  82 (2022)  - p. 765-776 , 2022
 
?
14

Residual stress classification of pulsed DC reactive sputte..:

Lo, Hsiao-Han ; Chen, Wei-Lun ; Wang, Peter J....
The International Journal of Advanced Manufacturing Technology.  119 (2022)  11-12 - p. 7449-7462 , 2022
 
?
15

Minimizing residual stress of aluminum nitride (AlN) thin f..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
 
1-15