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Lim, Junil
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1

Understanding phase evolution of ferroelectric Hf0.5Zr0.5O2..:

Shin, Jonghoon ; Seo, Haengha ; Ye, Kun Hee...
Journal of Materials Chemistry C.  12 (2024)  14 - p. 5035-5046 , 2024
Link: https://doi.org/10.1039/..
 
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2

Improved electrical performance of ultra-thin BexMg1−xO fil..:

Song, Haewon ; Wang, Bowen ; Shin, Jonghoon...
Journal of Materials Chemistry C.  12 (2024)  8 - p. 2714-2722 , 2024
Link: https://doi.org/10.1039/..
 
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3

Internal strain identification of seed-layered ZrO2, alumin..:

Seo, Haengha ; Park, Han Sol ; Cho, Seong Tak...
Journal of Applied Physics.  136 (2024)  1 - p. , 2024
Link: https://doi.org/10.1063/..
 
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4

Enhancing the Crystallization and Properties of the SrRuO3 ..:

Lim, Junil ; Ye, Kun Hee ; Kwon, Dae Seon...
ACS Applied Electronic Materials.  , 2023
Link: https://doi.org/10.1021/..
 
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5

The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Lay..:

Seo, Haengha ; Yeu, In Won ; Kwon, Dae Seon...
Advanced Electronic Materials.  8 (2022)  7 - p. , 2022
Link: https://doi.org/10.1002/..
 
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6

The Contrasting Impacts of the Al2O3 and Y2O3 Insertion Lay..:

Seo, Haengha ; Yeu, In Won ; Kwon, Dae Seon...
Advanced Electronic Materials.  8 (2022)  7 - p. , 2022
Link: https://doi.org/10.1002/..
 
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7

Enhanced Electrical Properties of an Al-Doped TiO2 Dielectr..:

Kwon, Dae Seon ; Kim, Tae Kyun ; Lim, Junil...
ACS Applied Electronic Materials.  4 (2022)  4 - p. 2005-2014 , 2022
Link: https://doi.org/10.1021/..
 
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8

Trap Reduction through O3 Post‐Deposition Treatment of Y2O3..:

Kim, Dong Gun ; Kwon, Dae Seon ; Lim, Junil...
Advanced Electronic Materials.  7 (2021)  2 - p. , 2021
Link: https://doi.org/10.1002/..
 
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9

Improved Properties of the Atomic Layer Deposited Ru Electr..:

Kwon, Dae Seon ; Jeon, Woojin ; Kim, Dong Gun...
ACS Applied Materials & Interfaces.  13 (2021)  20 - p. 23915-23927 , 2021
Link: https://doi.org/10.1021/..
 
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10

Optimized Al-doped TiO2 gate insulator for a metal-oxide-se..:

Kim, Dong Gun ; An, Cheol Hyun ; Kim, Sang Hyeon...
Journal of Materials Chemistry C.  9 (2021)  5 - p. 1572-1583 , 2021
Link: https://doi.org/10.1039/..
 
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11

Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thi..:

Kim, Dong Gun ; Kim, Hae-Ryoung ; Kwon, Dae Seon...
Journal of Physics D: Applied Physics.  54 (2021)  18 - p. 185110 , 2021
Link: https://doi.org/10.1088/..
 
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12

Atomic layer deposition of Ru thin films using (2,4-dimethy..:

Kwon, Dae Seon ; An, Cheol Hyun ; Kim, Sang Hyeon...
Journal of Materials Chemistry C.  8 (2020)  21 - p. 6993-7004 , 2020
Link: https://doi.org/10.1039/..
 
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13

Leakage Current Control of SrTiO3 Thin Films through Al Dop..:

Kim, Sang Hyeon ; Lee, Woongkyu ; An, Cheol Hyun...
physica status solidi (RRL) – Rapid Research Letters.  13 (2019)  11 - p. , 2019
Link: https://doi.org/10.1002/..
 
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14

Enhanced Electrical Properties of an Al-Doped TiO2 Dielectr..:

Kwon, Dae Seon ; Kim, Tae Kyun ; Lim, Junil...
ACS Applied Electronic Materials, Vol.4 No.4, pp.2005-2014.  , 2022
Link: https://hdl.handle.net/1..
 
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15

Improved Properties of the Atomic Layer Deposited Ru Electr..:

Dae Seon Kwon (6000884) ; Woojin Jeon (2828351) ; Dong Gun Kim (7340402)...
https://figshare.com/articles/journal_contribution/Improved_Properties_of_the_Atomic_Layer_Deposited_Ru_Electrode_for_Dynamic_Random-Access_Memory_Capacitor_Using_Discrete_Feeding_Method/14602391.  , 2021
Link: https://doi.org/10.1021/..
 
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