Luo, Qiusheng
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2

Multilayer regulatory landscape and new regulators identifi..:

Hu, Zhenzhu ; Wu, Zhihao ; Zhu, Qiangqiang...
Plant, Cell & Environment.  47 (2024)  8 - p. 3181-3197 , 2024
 
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3

Influence of SiO2–ZnO mixed soft abrasive on tribological b..:

Luo, Ziyuan ; Lu, Jiabin ; Yan, Qiusheng..
Materials Science in Semiconductor Processing.  176 (2024)  - p. 108318 , 2024
 
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Investigating surface wear characteristics of single-crysta..:

Hu, Da ; Lu, Jiabin ; Yan, Qiusheng..
Materials Science in Semiconductor Processing.  171 (2024)  - p. 108004 , 2024
 
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5

Development of a bioactive silk fibroin bilayer scaffold fo..:

Zhou, Shuiqing ; Wang, Qiusheng ; Yang, Wenjing...
International Journal of Biological Macromolecules.  255 (2024)  - p. 128350 , 2024
 
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6

Investigation into Surface Effects on the Crystal Nucleatio..:

Zhang, Jie ; Xu, Meixia ; Wu, Shuiqing...
Crystal Growth & Design.  23 (2023)  5 - p. 3535-3543 , 2023
 
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7

Tribological behavior of polycrystalline diamond based on p..:

Cai, Weiming ; Lu, Jiabin ; Xiong, Qiang..
Diamond and Related Materials.  140 (2023)  - p. 110430 , 2023
 
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9

Cluster magnetorheological global dynamic pressure planariz..:

Luo, Bin ; Li, Yuwei ; Yan, Qiusheng...
The International Journal of Advanced Manufacturing Technology.  128 (2023)  3-4 - p. 1213-1228 , 2023
 
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11

VTLayout: A Multi-Modal Approach for Video Text Layout:

, In: Proceedings of the 31st ACM International Conference on Multimedia,
Zhao, Yuxuan ; Ma, Jin ; Qi, Zhongang... - p. 2775-2784 , 2023
 
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12

Influences of process parameters on chemical mechanical pol..:

Xiong, Qiang ; Luo, Ziyuan ; Yan, Qiusheng..
Materials Science in Semiconductor Processing.  162 (2023)  - p. 107499 , 2023
 
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14

Chemical mechanical polishing exploiting metal electrochemi..:

Luo, Yingrong ; Xiong, Qiang ; Lu, Jiabin..
Materials Science in Semiconductor Processing.  152 (2022)  - p. 107067 , 2022
 
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15

Trash to treasure: Converting red mud into efficient cataly..:

Wang, Dongsheng ; Wang, Haixia ; Luo, Li..
Journal of Environmental Chemical Engineering.  10 (2022)  4 - p. 108161 , 2022
 
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