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Machida, Masatake
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1
Characterization of oxide films formed on Alloy 600 and All..:
Fujimoto, Shinji
;
Kim, Whee-Sung
;
Sato, Masugu
...
Journal of Solid State Electrochemistry. 19 (2015) 12 - p. 3521-3531 , 2015
Link:
https://doi.org/10.1007/..
?
2
Chemical State Analysis of Si-Doped CNT on SiC by Hard X-Ra..:
Son, Jin-Young
;
Machida, Masatake
;
Oji, Hiroshi
...
e-Journal of Surface Science and Nanotechnology. 9 (2011) - p. 54-57 , 2011
Link:
https://doi.org/10.1380/..
?
3
Study of Charge Trap Sites in SiN Films by Hard X-ray Photo..:
Kosemura, Daisuke
;
Takei, Munehisa
;
Nagata, Kohki
...
Japanese Journal of Applied Physics. 49 (2010) 4S - p. 04DD11 , 2010
Link:
https://doi.org/10.1143/..
?
4
Suppression Mechanism of Volume Shrinkage for SOG Film by P..:
Nagata, Kohki
;
Kosemura, Daisuke
;
Takei, Munehisa
...
ECS Transactions. 28 (2010) 2 - p. 347-354 , 2010
Link:
https://doi.org/10.1149/..
?
5
Improvement of CVD SiO2 by Post Deposition Microwave Plasma..:
Nagata, Kohki
;
Akamatsu, Hiroaki
;
Kosemura, Daisuke
...
ECS Transactions. 19 (2009) 9 - p. 45-51 , 2009
Link:
https://doi.org/10.1149/..
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