E-LIB Suche - Ergebnisse für: Maes, Jan Willem

1

MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion..:

Deijkers, Johanna (Sanne) H. ; de Jong, Arthur A. ; Mattinen, Miika J....
Advanced Materials Interfaces. 10 (2023) 12 - p. , 2023

Link: https://doi.org/10.1002/..

2

ALD Mo for Advanced MOL Local Interconnects:

, In: 2022 IEEE International Interconnect Technology Conference (IITC),

Hosseini, Maryamsadat ; Tierno, Davide ; Maes, Jan Willem... - p. 145-147 , 2022

Link: https://doi.org/10.1109/..

3

Barrierless ALD Molybdenum for Buried Power Rail and Via-to..:

, In: 2022 IEEE International Interconnect Technology Conference (IITC),

Gupta, Anshul ; Maes, Jan Willem ; Jourdan, Nicolas... - p. 58-60 , 2022

Link: https://doi.org/10.1109/..

4

Pulsed chemical vapor deposition of conformal GeSe for appl..:

Haider, Ali ; Deng, Shaoren ; Devulder, Wouter...
Materials Advances. 2 (2021) 5 - p. 1635-1643 , 2021

Link: https://doi.org/10.1039/..

5

Extensive assessment of the charge-trapping kinetics in InG..:

Putcha, Vamsi ; Franco, Jacopo ; Vais, Abhitosh...
Microelectronics Reliability. 115 (2020) - p. 113996 , 2020

Link: https://doi.org/10.1016/..

6

(Invited) ALD Materials for the Integration of III-V Based ..:

Givens, Michael ; Tang, Fu ; Xie, Qi.
ECS Transactions. 69 (2015) 7 - p. 119-131 , 2015

Link: https://doi.org/10.1149/..

7

Engineering the III-V Gate Stack Properties by Optimization..:

Sioncke, Sonja ; Nyns, Laura ; Ivanov, Tsvetan...
ECS Transactions. 64 (2014) 9 - p. 133-144 , 2014

Link: https://doi.org/10.1149/..

8

Characterization of Epitaxial Si:C:P and Si:P Layers for So..:

Rosseel, Erik ; Profijt, Harald Benjamin ; Hikavyy, Andriy Yakovitch...
ECS Transactions. 64 (2014) 6 - p. 977-987 , 2014

Link: https://doi.org/10.1149/..

9

(Invited) Current Status of High-k and Metal Gates in CMOS:

Wilk, Glen D. ; Verghese, Mohith ; Chen, Peijun.
ECS Transactions. 50 (2013) 4 - p. 207-210 , 2013

Link: https://doi.org/10.1149/..

10

Orientation Dependence of Si1-xCx:P Growth and the Impact o..:

Tolle, John ; Weeks, K. Doran ; Bauer, Matthias...
ECS Transactions. 50 (2013) 9 - p. 491-497 , 2013

Link: https://doi.org/10.1149/..

11

High Efficiency Low Temperature Pre-epi Clean Method for Ad..:

Machkaoutsan, Vladimir ; Weeks, K. Doran ; Bauer, Matthias...
ECS Transactions. 50 (2013) 9 - p. 339-348 , 2013

Link: https://doi.org/10.1149/..

12

Evaluation of plasma parameters on PEALD deposited TaCN:

Piallat, Fabien ; Beugin, Virginie ; Gassilloud, Remy...
Microelectronic Engineering. 107 (2013) - p. 156-160 , 2013

Link: https://doi.org/10.1016/..

13

Evaluation of HfLaOx as Blocking Layer for Innovative Nonvo..:

Del Vitto, Annalisa ; Piagge, Rossella ; Ravizza, Enrica...
ECS Transactions. 33 (2010) 3 - p. 417-424 , 2010

Link: https://doi.org/10.1149/..

14

Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of ..:

Delabie, Annelies ; Caymax, Matty ; Gielis, Sven...
Electrochemical and Solid-State Letters. 13 (2010) 6 - p. H176 , 2010

Link: https://doi.org/10.1149/..

15

Impact of Hf-Precursor Choice on Scaling and Performance of..:

Maes, Jan Willem ; Fedorenko, Yanina ; Delabie, Annelies...
ECS Transactions. 11 (2007) 4 - p. 59-72 , 2007

Link: https://doi.org/10.1149/..