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Maruyama, Ken
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1

Effect of canagliflozin on the decline of estimated glomeru..:

Wada, Takashi ; Mori‐Anai, Kazumi ; Takahashi, Akiko...
Journal of Diabetes Investigation.  13 (2022)  12 - p. 1981-1989 , 2022
Link: https://doi.org/10.1111/..
 
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2

Signature verification based on inter-stroke and intra-stro..:

Shin, Jungpil ; Maruyama, Ken ; Kim, Cheol Min
ACM SIGAPP Applied Computing Review.  17 (2017)  1 - p. 26-34 , 2017
Link: https://dl.acm.org/doi/1..
 
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3

Novel EUV Photoresist for Sub-7 nm Node:

Suzuki, Junya ; Furukawa, Tsuyoshi ; Miyata, Hiromu...
Journal of Photopolymer Science and Technology.  30 (2017)  6 - p. 671-674 , 2017
Link: https://doi.org/10.2494/..
 
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4

Signature verification based on inter-stroke and intra-stro..:

Shin, Jungpil ; Maruyama, Ken ; Kim, Cheol Min
ACM SIGAPP Applied Computing Review.  17 (2017)  1 - p. 26-34 , 2017
Link: https://doi.org/10.1145/..
 
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5

On-Line Signature Verification Using Inter-Stroke Informati..:

, In: Proceedings of the International Conference on Research in Adaptive and Convergent Systems,
Shin, Jungpil ; Maruyama, Ken ; Kim, Cheol Min - p. 80-84 , 2016
Link: https://dl.acm.org/doi/1..
 
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6

Novel EUV Resists Materials for 16nm HP and beyond:

Sakai, Kazunori ; Shiratani, Motohiro ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 639-644 , 2014
Link: https://doi.org/10.2494/..
 
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7

Novel EUV Resist Materials and Process for 20 nm Half Pitch..:

Inukai, Koji ; Maruyama, Ken ; Kawakami, Takanori...
Journal of Photopolymer Science and Technology.  26 (2013)  6 - p. 691-695 , 2013
Link: https://doi.org/10.2494/..
 
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8

LER Limitations of Resist Thin Films:

Cardineau, Brian ; Early, William ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  25 (2012)  5 - p. 633-640 , 2012
Link: https://doi.org/10.2494/..
 
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9

Novel Material Development for EUV Resist towards sub-20nm ..:

Shioya, Takeo ; Maruyama, Ken ; Kimura, Tooru
Journal of Photopolymer Science and Technology.  24 (2011)  2 - p. 199-204 , 2011
Link: https://doi.org/10.2494/..
 
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10

JSR EUV Resist Development toward 22nmhp Design and Beyond:

Kimura, Tooru ; Nishino, Kouta ; Shimizu, Makoto...
Journal of Photopolymer Science and Technology.  23 (2010)  5 - p. 643-648 , 2010
Link: https://doi.org/10.2494/..
 
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11

Synthesis and properties of photo‐functional hyperbranched ..:

Nishikubo, Tadatomi ; Kudo, Hiroto ; Maruyama, Ken
Polymers for Advanced Technologies.  20 (2009)  6 - p. 529-535 , 2009
Link: https://doi.org/10.1002/..
 
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12

A novel noria (water-wheel-like cyclic oligomer) derivative..:

Kudo, Hiroto ; Watanabe, Daisuke ; Nishikubo, Tadatomi...
Journal of Materials Chemistry.  18 (2008)  30 - p. 3588 , 2008
Link: https://doi.org/10.1039/..
 
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13

Progress in EUV Resist Development:

Shimizu, Daisuke ; Maruyama, Ken ; Saitou, Akio...
Journal of Photopolymer Science and Technology.  20 (2007)  3 - p. 423-428 , 2007
Link: https://doi.org/10.2494/..
 
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14

Synthesis and Properties of Photo-Cross-Linkable Hyperbranc..:

Maruyama, Ken ; Kudo, Hiroto ; Ikehara, Takayuki...
Macromolecules.  40 (2007)  14 - p. 4895-4900 , 2007
Link: https://doi.org/10.1021/..
 
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15

Syntheses and properties of hyperbranched polybenzoxazole b..:

Kudo, Hiroto ; Maruyama, Ken ; Shindo, Syoko..
Journal of Polymer Science Part A: Polymer Chemistry.  44 (2006)  11 - p. 3640-3649 , 2006
Link: https://doi.org/10.1002/..
 
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