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Meitei, Pheiroijam Nonglen
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1

Forming-free RRAM device based on HfO2 thin film for non-vo..:

Moirangthem, Borish ; Meitei, Pheiroijam Nonglen ; Debnath, Anil Krishna.
Journal of Materials Science: Materials in Electronics.  34 (2023)  4 - p. , 2023
Link: https://doi.org/10.1007/..
 
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2

A Novel Differential Voltage Current Conveyor (DVCC) Based ..:

Vista, John ; Pheiroijam, Nonglen Meitei ; Pamu, Harika..
IETE Journal of Research.  68 (2019)  1 - p. 243-254 , 2019
Link: https://doi.org/10.1080/..
 
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3

Universal Biquadratic filter with minimum number of Active ..:

Tarunkumar, Huirem ; Ranjan, Ashish ; Pheiroijam, Nonglen Meitei
Procedia Computer Science.  125 (2018)  - p. 818-824 , 2018
Link: https://doi.org/10.1016/..
 
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4

Four Input Single Output based third order universal filter..:

Tarunkumar, Huirem ; Ranjan, Ashish ; Perumalla, Subrahmanyam.
Analog Integrated Circuits and Signal Processing.  93 (2017)  1 - p. 87-98 , 2017
Link: https://doi.org/10.1007/..
 
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5

Non-volatile Memory Application Based on Gd2O3 Nanorod:

, In: Springer Proceedings in Materials; Recent Advances in Materials,
Meitei, Ph. Nonglen ; Singh, Naorem Khelchand - p. 103-108 , 2023
Link: https://doi.org/10.1007/..
 
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6

GLAD Fabricated Self-Powered Photodetector Based on WO3 wit..:

Alam, Mir Waqas ; Meitei, Ph. Nonglen ; Aldughaylibi, Fatimah Saeed...
International Journal of Energy Research.  2023 (2023)  - p. 1-10 , 2023
Link: https://doi.org/10.1155/..
 
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7

Self-Powered Photodetector Based on a Ag Nanoparticle-Decor..:

Meitei, Ph. Nonglen ; Singh, Naorem Khelchand
ACS Applied Electronic Materials.  , 2023
Link: https://doi.org/10.1021/..
 
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8

Enhanced UV photodetection characteristics of annealed Gd2O..:

Meitei, Ph. Nonglen ; Alam, Mir Waqas ; Ngangbam, Chitralekha.
Applied Nanoscience.  11 (2021)  4 - p. 1437-1445 , 2021
Link: https://doi.org/10.1007/..
 
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9

Effect of annealing on forming-free bipolar resistive switc..:

Nonglen Meitei, Ph. ; Singh, Naorem Khelchand
Journal of Alloys and Compounds.  941 (2023)  - p. 168900 , 2023
Link: https://doi.org/10.1016/..
 
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