E-LIB Suche - Ergebnisse für: Mertens, Paul

1

Monitoring of Trace Molecular Impurities in Clean-Room Air:

Kenis, Karine ; Mertens, Paul ; Altamirano-Sanchez, Efrain..
Solid State Phenomena. 346 (2023) - p. 183-188 , 2023

Link: https://doi.org/10.4028/..

2

Ultra clean processing of semiconductor surfaces XII: selec..

Solid State Phenomena, Volume 219

Mertens, Paul ; Meuris, Marc ; Heyns, Marc , 2014

Link: https://search.ebscohost..

3

The Influence of Dissolved Carbon Dioxide on Cavitation Int..:

Brems, Steven ; Hauptmann, Marc ; Camerotto, Elisabeth...
Japanese Journal of Applied Physics. 52 (2013) 6R - p. 066602 , 2013

Link: https://doi.org/10.7567/..

4

Ultra clean processing of semiconductor surfaces XI: select..

Solid state phenomena, v. 195

Heyns, Marc ; Mertens, Paul ; Meuris, Marc , 2013

Link: https://search.ebscohost..

5

Hyperpolarization‐activated cyclic nucleotide‐gated 1 indep..:

Eggink, Hannah ; Mertens, Paul ; Storm, Eline.
Hippocampus. 24 (2013) 3 - p. 249-256 , 2013

Link: https://doi.org/10.1002/..

6

Ultra clean processing of semiconductor surfaces X: selecte..

Solid state phenomena, v. 187

Mertens, Paul ; Meuris, Marc ; Heyns, Marc , 2012

Link: https://search.ebscohost..

7

Cleaning Aspects of Novel Materials after CMP:

Vos, Rita ; Wada, Masayuki ; Arnauts, Sophia...
ECS Transactions. 34 (2011) 1 - p. 671-676 , 2011

Link: https://doi.org/10.1149/..

8

Ultra clean processing of semiconductor surfaces IX (UCPSS ..

Diffusion and defect data - solid state data. Pt. B, Solid state phenomena, volumes 145-146

Mertens, Paul ; Meuris, Marc ; Heyns, Marc , 2009

Link: https://search.ebscohost..

9

Particle Removal and Damage Thresholds from Particle Remova..:

Wostyn, Kurt L. ; Wada, Masayuki ; Andreas, Michael...
ECS Transactions. 25 (2009) 5 - p. 211-217 , 2009

Link: https://doi.org/10.1149/..

10

Characterization of 248nm Deep Ultraviolet (DUV) Photoresis..:

Tsvetanova, Diana ; Vos, Rita ; Vereecke, Guy...
ECS Transactions. 25 (2009) 5 - p. 187-194 , 2009

Link: https://doi.org/10.1149/..

11

Electrochemical and Analytical Study of the Si Etching Mech..:

Valckx, Nick ; Vos, Rita ; Rip, Jens...
ECS Transactions. 25 (2009) 5 - p. 383-389 , 2009

Link: https://doi.org/10.1149/..

12

New Wet Process Strategies for Reduced La2O3 and MgO2 High-..:

Wada, Masayuki ; Vos, Rita ; Claes, Martine...
ECS Transactions. 25 (2009) 5 - p. 45-51 , 2009

Link: https://doi.org/10.1149/..

13

Particle Removal Efficiency and Damage Analysis on Silicon ..:

Barbagini, Francesca ; Halder, Sandip ; Janssens, Tom...
Journal of Adhesion Science and Technology. 23 (2009) 12 - p. 1709-1721 , 2009

Link: https://doi.org/10.1163/..

14

Impact of Acoustical Reflections on Megasonic Cleaning Perf..:

Brems, Steven ; Hauptmann, Marc ; Camerotto, Elisabeth...
ECS Transactions. 25 (2009) 5 - p. 287-294 , 2009

Link: https://doi.org/10.1149/..

15

Investigation of Physical Cleaning Process Window by Atomic..:

Kim, Tae-Gon ; Wostyn, Kurt ; Bearda, Twan...
ECS Transactions. 25 (2009) 5 - p. 203-210 , 2009

Link: https://doi.org/10.1149/..