I agree that this site is using cookies. You can find further informations here.
X
Mitschker, F.
22  results:
Search for persons X
?
1

Characterisation of micropores in plasma deposited SiO xfil..:

Hoppe, C ; Mitschker, F ; Butterling, M...
Journal of Physics D: Applied Physics.  53 (2020)  47 - p. 475205 , 2020
Link: https://doi.org/10.1088/..
 
?
2

Ultraviolet/vacuum-ultraviolet emission from a high power m..:

Iglesias, E J ; Hecimovic, A ; Mitschker, F...
Journal of Physics D: Applied Physics.  53 (2019)  5 - p. 055202 , 2019
Link: https://doi.org/10.1088/..
 
?
3

Comparative study on the deposition of silicon oxide permea..:

Mitschker, F ; Schücke, L ; Hoppe, Ch...
Journal of Physics D: Applied Physics.  51 (2018)  23 - p. 235201 , 2018
Link: https://doi.org/10.1088/..
 
?
4

Influence of average ion energy and atomic oxygen flux per ..:

Mitschker, F ; Wißing, J ; Hoppe, Ch...
Journal of Physics D: Applied Physics.  51 (2018)  14 - p. 145201 , 2018
Link: https://doi.org/10.1088/..
 
?
5

Adhesion of plasma-deposited silicon oxide barrier layers o..:

Hoppe, C. ; Mitschker, F. ; Awakowicz, P....
Surface and Coatings Technology.  335 (2018)  - p. 25-31 , 2018
Link: https://doi.org/10.1016/..
 
?
6

Influence of organic surface chemistry on the nucleation of..:

Hoppe, C ; Mitschker, F ; Giner, I...
Journal of Physics D: Applied Physics.  50 (2017)  20 - p. 204002 , 2017
Link: https://doi.org/10.1088/..
 
?
7

In situmeasurement of VUV/UV radiation from low-pressure mi..:

Iglesias, E J ; Mitschker, F ; Fiebrandt, M..
Measurement Science and Technology.  28 (2017)  8 - p. 085501 , 2017
Link: https://doi.org/10.1088/..
 
?
8

Temperature-dependent transport mechanisms through PE-CVD c..:

Kirchheim, D ; Wilski, S ; Jaritz, M...
Journal of Physics D: Applied Physics.  50 (2017)  39 - p. 395302 , 2017
Link: https://doi.org/10.1088/..
 
?
9

Influence of PE-CVD and PE-ALD on defect formation in perme..:

Mitschker, F ; Steves, S ; Gebhard, M...
Journal of Physics D: Applied Physics.  50 (2017)  23 - p. 235201 , 2017
Link: https://doi.org/10.1088/..
 
?
10

An efficient PE-ALD process for TiO2 thin films employing a..:

Gebhard, M. ; Mitschker, F. ; Wiesing, M....
Journal of Materials Chemistry C.  4 (2016)  5 - p. 1057-1065 , 2016
Link: https://doi.org/10.1039/..
 
?
11

The effect of UV radiation from oxygen and argon plasma on ..:

Jaritz, M ; Behm, H ; Hopmann, Ch...
Journal of Physics D: Applied Physics.  50 (2016)  1 - p. 015201 , 2016
Link: https://doi.org/10.1088/..
 
?
12

Spectroscopic studies of microwave plasmas containing hexam..:

Nave, A S C ; Mitschker, F ; Awakowicz, P.
Journal of Physics D: Applied Physics.  49 (2016)  39 - p. 395206 , 2016
Link: https://doi.org/10.1088/..
 
?
13

Influence of layer type and order on barrier properties of ..:

Bahroun, K ; Behm, H ; Mitschker, F...
Journal of Physics D: Applied Physics.  47 (2013)  1 - p. 015201 , 2013
Link: https://doi.org/10.1088/..
 
?
14

Time-resolved measurement of film growth during high-power ..:

Mitschker, F ; Prenzel, M ; Benedikt, J..
Journal of Physics D: Applied Physics.  46 (2013)  15 - p. 155204 , 2013
Link: https://doi.org/10.1088/..
 
?
15

Time-resolved measurement of film growth during reactive hi..:

Mitschker, F ; Prenzel, M ; Benedikt, J..
Journal of Physics D: Applied Physics.  46 (2013)  49 - p. 495201 , 2013
Link: https://doi.org/10.1088/..
 
1-15