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Nagai, Tomoki
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1

In Situ Evaluation of Drill Wear Using Tool Image Captured ..:

Furuki, Tatsuya ; Nagai, Tomoki ; Nishigaki, Koichi..
International Journal of Automation Technology.  18 (2024)  2 - p. 181-188 , 2024
Link: https://doi.org/10.20965..
 
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2

Preparation of water-dispersible Janus nanosheets from K4Nb..:

Suzuki, Ryoko ; Nagai, Tomoki ; Onitsuka, Emika...
Dalton Transactions.  51 (2022)  9 - p. 3625-3635 , 2022
Link: https://doi.org/10.1039/..
 
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3

Novel EUV Photoresist for Sub-7 nm Node:

Suzuki, Junya ; Furukawa, Tsuyoshi ; Miyata, Hiromu...
Journal of Photopolymer Science and Technology.  30 (2017)  6 - p. 671-674 , 2017
Link: https://doi.org/10.2494/..
 
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4

Novel High Sensitivity EUV Photoresist for Sub-7 nm Node:

Nagai, Tomoki ; Nakagawa, Hisashi ; Naruoka, Takehiko...
Journal of Photopolymer Science and Technology.  29 (2016)  3 - p. 475-478 , 2016
Link: https://doi.org/10.2494/..
 
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5

Novel EUV Resist Development for Sub-14nm Half Pitch:

Kimoto, Takakazu ; Naruoka, Takehiko ; Nakagawa, Hisashi...
Journal of Photopolymer Science and Technology.  28 (2015)  4 - p. 519-523 , 2015
Link: https://doi.org/10.2494/..
 
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6

Preface for Special Issue of Advanced Patterning Materials ..:

Nagai, Tomoki ; Watanabe, Takeo
Journal of Photopolymer Science and Technology.  28 (2015)  6 - p. 775-775 , 2015
Link: https://doi.org/10.2494/..
 
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7

Recent EUV Resists toward High Volume Manufacturing:

Nakagawa, Hisashi ; Naruoka, Takehiko ; Nagai, Tomoki
Journal of Photopolymer Science and Technology.  27 (2014)  6 - p. 739-746 , 2014
Link: https://doi.org/10.2494/..
 
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8

Novel EUV Resists Materials for 16nm HP and beyond:

Sakai, Kazunori ; Shiratani, Motohiro ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 639-644 , 2014
Link: https://doi.org/10.2494/..
 
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9

Self-Consistent Field Theory of Directed Self-Assembly on C..:

Tominaga, Tetsuo ; Minegishi, Shinya ; Komatsu, Hiroyuki...
Journal of Photopolymer Science and Technology.  27 (2014)  1 - p. 49-52 , 2014
Link: https://doi.org/10.2494/..
 
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10

Development of Directed Self-Assembly Materials for Sub 10 ..:

Komatsu, Hiroyuki ; Hori, Masafumi ; Minegishi, Shinya..
Journal of Photopolymer Science and Technology.  27 (2014)  4 - p. 425-429 , 2014
Link: https://doi.org/10.2494/..
 
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11

Directed Self Assembly Materials for Semiconductor Lithogra..:

Minegishi, Shinya ; Naruoka, Takehiko ; Nagai, Tomoki
Journal of Photopolymer Science and Technology.  26 (2013)  6 - p. 793-800 , 2013
Link: https://doi.org/10.2494/..
 
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12

Directed Self Assembly Material Development for Fine Patter..:

Minegishi, Shinya ; Namie, Yuji ; Izumi, Kenichi...
Journal of Photopolymer Science and Technology.  26 (2013)  1 - p. 27-30 , 2013
Link: https://doi.org/10.2494/..
 
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13

Directed Self Assembly Materials for Hole Patterning:

Minegishi, Shinya ; Anno, Yusuke ; Namie, Yuji.
Journal of Photopolymer Science and Technology.  25 (2012)  1 - p. 21-25 , 2012
Link: https://doi.org/10.2494/..
 
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14

A New Materials-based Pitch Division Technique:

Gu, Xinyu ; Bates, Christopher ; Cho, Younjin...
Journal of Photopolymer Science and Technology.  22 (2009)  6 - p. 773-781 , 2009
Link: https://doi.org/10.2494/..
 
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15

Toward the Design of a Sequential Two Photon Photoacid Gene..:

O'Connor, Naphtali A. ; Berro, Adam J. ; Lancaster, Jeffrey R....
Chemistry of Materials.  20 (2008)  24 - p. 7374-7376 , 2008
Link: https://doi.org/10.1021/..
 
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