Nishimura, Isao
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1

Development of Low-Residual-Stress Photosensitive Adhesive ..:

Doi, Takashi ; Nishimura, Isao ; Kaneko, Masahiro.
Journal of Photopolymer Science and Technology.  35 (2022)  4 - p. 313-319 , 2022
 
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2

Development of new dielectric material to reduce transmissi..:

, In: 2020 IEEE 70th Electronic Components and Technology Conference (ECTC),
 
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5

Development of New Photosensitive Low CTE Materials:

Doi, Takashi ; Uno, Takaaki ; Nishimura, Isao.
Journal of Photopolymer Science and Technology.  28 (2015)  3 - p. 407-410 , 2015
 
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6

Improvement of Post Exposure Delay of Photo-Patternable and..:

Kubo, Hiroto ; Doi, Takashi ; Nishimura, Isao...
Journal of Photopolymer Science and Technology.  28 (2015)  3 - p. 411-414 , 2015
 
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11

Syntheses and properties of hyperbranched polybenzoxazole b..:

Kudo, Hiroto ; Maruyama, Ken ; Shindo, Syoko..
Journal of Polymer Science Part A: Polymer Chemistry.  44 (2006)  11 - p. 3640-3649 , 2006
 
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14

Novel Molecular Photo-resists Based on the Cyclodextrin Der..:

Kudo, Hiroto ; Inoue, Naomi ; Nishimura, Isao.
Bulletin of the Chemical Society of Japan.  78 (2005)  4 - p. 731-737 , 2005
 
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