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Nishiyama, Iwao
137
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Online (137)
Mediatypes
Articles (Online) (111)
OpenAccess-fulltext (26)
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1
Transportation of hydrogen radicals for cleaning extreme ul..:
Kuroki, Yuya
;
Funakoshi, Naoto
;
Nishiyama, Iwao
.
Thin Solid Films. 575 (2015) - p. 110-112 , 2015
Link:
https://doi.org/10.1016/..
?
2
Performance and quality analysis of Mo–Si multilayers forme..:
Hiruma, Kenji
;
Miyagaki, Shinji
;
Yamanashi, Hiromasa
..
Thin Solid Films. 516 (2008) 8 - p. 2050-2057 , 2008
Link:
https://doi.org/10.1016/..
?
3
Cleaning technology for EUV multilayer mirror using atomic ..:
Motai, Kumi
;
Oizumi, Hiroaki
;
Miyagaki, Shinji
...
Thin Solid Films. 516 (2008) 5 - p. 839-843 , 2008
Link:
https://doi.org/10.1016/..
?
4
Reduction of oxide layer on various metal surfaces by atomi..:
Izumi, Akira
;
Ueno, Tomoya
;
Miyazaki, Yasuo
..
Thin Solid Films. 516 (2008) 5 - p. 853-855 , 2008
Link:
https://doi.org/10.1016/..
?
5
Patterning capability of new molecular resist in EUV lithog..:
Oizumi, Hiroaki
;
Tanaka, Yuusuke
;
Kumise, Takaaki
...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1049-1053 , 2007
Link:
https://doi.org/10.1016/..
?
6
Methodology of Merging Optical-Proximity-Effect Correction ..:
Sugawara, Minoru
;
Nishiyama, Iwao
Japanese Journal of Applied Physics. 46 (2007) 10R - p. 6554 , 2007
Link:
https://doi.org/10.1143/..
?
7
Progress in EUV Resist Development:
Shimizu, Daisuke
;
Maruyama, Ken
;
Saitou, Akio
...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 423-428 , 2007
Link:
https://doi.org/10.2494/..
?
8
Evaluation of New Molecular Resist for EUV Lithography:
Oizumi, Hiroaki
;
Tanaka, Yuusuke
;
Kumise, Takaaki
...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 403-410 , 2007
Link:
https://doi.org/10.2494/..
?
9
Atomic Hydrogen Cleaning of Surface Ru Oxide Formed by Extr..:
Oizumi, Hiroaki
;
Izumi, Akira
;
Motai, Kumi
..
Japanese Journal of Applied Physics. 46 (2007) 7L - p. L633 , 2007
Link:
https://doi.org/10.1143/..
?
10
Impact of Slanted Absorber Side Walls on Critical Dimension..:
Sugawara, Minoru
;
Nishiyama, Iwao
Japanese Journal of Applied Physics. 46 (2007) 1R - p. 84 , 2007
Link:
https://doi.org/10.1143/..
?
11
LER evaluation of molecular resist for EUV lithography:
Shiono, Daiju
;
Hada, Hideo
;
Yukawa, Hiroto
...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1084-1087 , 2007
Link:
https://doi.org/10.1016/..
?
12
Analysis of Printability of Scratch Defect on Reflective Ma..:
Sugawara, Minoru
;
Nishiyama, Iwao
;
Motai, Kumi
.
Japanese Journal of Applied Physics. 45 (2006) 12R - p. 9044 , 2006
Link:
https://doi.org/10.1143/..
?
13
Performance of molecular resist based on polyphenol in EUV ..:
Oizumi, Hiroaki
;
Kumasaka, Fumiaki
;
Tanaka, Yuusuke
...
Microelectronic Engineering. 83 (2006) 4-9 - p. 1107-1110 , 2006
Link:
https://doi.org/10.1016/..
?
14
Evaluation of Resist Capability for EUV Lithography:
Oizumi, Hiroaki
;
Tanaka, Yusuke
;
Shiono, Daiji
...
Journal of Photopolymer Science and Technology. 19 (2006) 4 - p. 507-514 , 2006
Link:
https://doi.org/10.2494/..
?
15
Performance of dilatometer for determining absolute CTE of ..:
Takeichi, Yoshimasa
;
Nishiyama, Iwao
;
Yamada, Naofumi
Microelectronic Engineering. 83 (2006) 4-9 - p. 1617-1620 , 2006
Link:
https://doi.org/10.1016/..
1-15