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Padmanaban, Munirathna
15
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Online (15)
Mediatypes
Articles (Online) (13)
OpenAccess-fulltext (2)
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1
Designing an ordered template of cylindrical arrays based o..:
Pinge, Shubham
;
Lin, Guanyang
;
Baskaran, Durairaj
..
Soft Matter. 14 (2018) 4 - p. 597-613 , 2018
Link:
https://doi.org/10.1039/..
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2
Spin-on Metal Oxides and Their Applications for Next Genera..:
Yao, Huirong
;
Mullen, Salem
;
Wolfer, Elizabeth
...
Journal of Photopolymer Science and Technology. 29 (2016) 1 - p. 59-67 , 2016
Link:
https://doi.org/10.2494/..
?
3
Progress in Spin-on Hard Mask Materials for Advanced Lithog..:
Padmanaban, Munirathna
;
Cho, JoonYeon
;
Kudo, Takanori
...
Journal of Photopolymer Science and Technology. 27 (2014) 4 - p. 503-509 , 2014
Link:
https://doi.org/10.2494/..
?
4
Responding to the Challenge: Materials Design for Immersion..:
Padmanaban, Munirathna
;
Romano, Andrew
;
Lin, Guanyang
...
Journal of Photopolymer Science and Technology. 19 (2006) 4 - p. 555-563 , 2006
Link:
https://doi.org/10.2494/..
?
5
Influence of ArF Resist Components and Process Conditions o..:
Padmanaban, Munirathna
;
Anyadiegwu, Clement
;
Kanda, Takashi
...
Journal of Photopolymer Science and Technology. 16 (2003) 4 - p. 475-481 , 2003
Link:
https://doi.org/10.2494/..
?
6
Optimization of 193 nm Contact Hole Resists for 100 nm Node:
Kudo, Takanori
;
Alemy, Eric L.
;
Dammel, Ralph R.
...
Journal of Photopolymer Science and Technology. 15 (2002) 4 - p. 549-558 , 2002
Link:
https://doi.org/10.2494/..
?
7
Etch Properties of 193nm Resists: Issues and Approaches:
Padmanaban, Munirathna
;
Alemy, Eric
;
Dammel, Ralph
...
Journal of Photopolymer Science and Technology. 15 (2002) 3 - p. 521-527 , 2002
Link:
https://doi.org/10.2494/..
?
8
Mechanistic Studies on the CD Degradation of 193nm Resists ..:
Kudo, Takanori
;
Dammel, Ralph R.
;
Bae, Jun-Born
...
Journal of Photopolymer Science and Technology. 14 (2001) 3 - p. 407-417 , 2001
Link:
https://doi.org/10.2494/..
?
9
Materials and Resists for 193 and 157nm Applications:
Padmanaban, Munirathna
;
Alemy, Eric
;
Bae, Jun-Bom
...
Journal of Photopolymer Science and Technology. 14 (2001) 4 - p. 631-642 , 2001
Link:
https://doi.org/10.2494/..
?
10
Layer-Specific Resists for 193nm Lithography:
Padmanaban, Munirathna
;
Bae, Jun-Bom
;
Kim, Woo-Kyu
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 607-615 , 2000
Link:
https://doi.org/10.2494/..
?
11
Sensitized Transparent Photobase Additive For 193 nm Lithog..:
Padmanaban, Munirathna
;
Bae, Jun-Born
;
Cook, Michelle
...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 617-624 , 2000
Link:
https://doi.org/10.2494/..
?
12
Bottom Anti-Reflective Coatings for DUV Lithography:
Kang, Wen-Bing
;
Tanaka, Hatsuyuki
;
Kimura, Ken
...
Journal of Photopolymer Science and Technology. 10 (1997) 3 - p. 471-477 , 1997
Link:
https://doi.org/10.2494/..
?
13
Progress in acetal based deep UV resist:
Padmanaban, Munirathna
;
Kinoshita, Yoshiaki
;
Kudo, Takanori
...
Journal of Photopolymer Science and Technology. 7 (1994) 3 - p. 461-472 , 1994
Link:
https://doi.org/10.2494/..
?
14
CHEM 122-002: Fundamentals of Chemical Principles II:
Padmanaban, Munirathna
https://digitalcommons.njit.edu/chem-syllabi/60. , 2019
Link:
https://digitalcommons.n..
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15
CHEM 122-102: Fundamentals of Chemical Principles II:
Padmanaban, Munirathna
https://digitalcommons.njit.edu/chem-syllabi/61. , 2019
Link:
https://digitalcommons.n..
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