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2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA) ,
2
Contact Optimization Through Annealing and Edge Functionali..:
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2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) ,
5
Scaled contact length with low contact resistance in monola..:
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2023 International Electron Devices Meeting (IEDM) ,
7
Monolayer-MoS2 Stacked Nanosheet Channel with C-type Metal ..:
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2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ,
9
Effect of Metal Coupling on Schottky Barrier Height Extract..:
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2023 International Electron Devices Meeting (IEDM) ,
10
High-Endurance MoS2 FeFET with Operating Voltage Fess Than ..:
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2023 International Electron Devices Meeting (IEDM) ,
13
Status and Performance of Integration Modules Toward Scaled..:
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2023 International Electron Devices Meeting (IEDM) ,
14
Low N-Type Contact Resistance to Carbon Nanotubes in Highly..:
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2022 International Electron Devices Meeting (IEDM) ,
15