Reitemeier, Julius
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Wet etch methods to achieve submicron active area self-alig..:

Jönsson, Adam ; Xu, Pengcheng ; Reitemeier, Julius..
Materials Science in Semiconductor Processing.  171 (2024)  - p. 108036 , 2024
 
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Hydrophobic Gating and Spatial Confinement in Hierarchicall..:

Reitemeier, Julius ; Baek, Seol ; Bohn, Paul W.
ACS Applied Materials & Interfaces.  15 (2023)  33 - p. 39707-39715 , 2023
 
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