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Sakamoto, Rikimaru
28  results:
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1

Novel Spin on Planarization Technology by Photo Curing SOC ..:

Endo, Takafumi ; Sakamoto, Rikimaru ; Hashimoto, Keisuke...
Journal of Photopolymer Science and Technology.  30 (2017)  3 - p. 373-378 , 2017
Link: https://doi.org/10.2494/..
 
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2

New Approach for ArFi Extension by Dry Development Rinse Pr..:

Shibayama, Wataru ; Shigaki, Shuhei ; Takeda, Satoshi...
Journal of Photopolymer Science and Technology.  29 (2016)  1 - p. 69-74 , 2016
Link: https://doi.org/10.2494/..
 
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3

Dry Development Rinse Process (DDRP) & Materials (DDRM) For..:

Shibayama, Wataru ; Shigaki, Shuhei ; Nakajima, Makoto...
Journal of Photopolymer Science and Technology.  29 (2016)  3 - p. 469-474 , 2016
Link: https://doi.org/10.2494/..
 
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4

(Invited) The Novel Spin-on Hard Mask and Ultra Thin UL Mat..:

Sakamoto, Rikimaru ; Yaguchi, Hiroaki ; Shigaki, Syuhei...
ECS Transactions.  60 (2014)  1 - p. 263-271 , 2014
Link: https://doi.org/10.1149/..
 
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5

The Impact and Optimization of EUV Sensitive Si Hardmask fo..:

Shigaki, Shuhei ; Onishi, Ryuji ; Yaguchi, Hiroaki...
Journal of Photopolymer Science and Technology.  26 (2013)  5 - p. 679-683 , 2013
Link: https://doi.org/10.2494/..
 
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6

New Approach for Reducing the Out of Band effect and Outgas..:

Sakamoto, Rikimaru ; Onishi, Ryuji ; Fujitani, Noriaki.
ECS Transactions.  52 (2013)  1 - p. 259-265 , 2013
Link: https://doi.org/10.1149/..
 
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7

The Novel Solution for Negative Impact of Out-of-band and O..:

Sakamoto, Rikimaru ; Fujitani, Noriaki ; Onishi, Ryuji.
Journal of Photopolymer Science and Technology.  26 (2013)  5 - p. 685-689 , 2013
Link: https://doi.org/10.2494/..
 
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8

Development of Under Layer Material for EUV Lithography:

Sakamoto, Rikimaru ; Ho, Bang-Ching ; Fujitani, Noriaki..
ECS Transactions.  34 (2011)  1 - p. 257-262 , 2011
Link: https://doi.org/10.1149/..
 
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9

Backexposure Effect in Chemically Amplified Resist Process ..:

Kozawa, Takahiro ; Tagawa, Seiichi ; Ohnishi, Ryuji..
Japanese Journal of Applied Physics.  50 (2011)  1R - p. 016504 , 2011
Link: https://doi.org/10.1143/..
 
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10

Backexposure Effect in Chemically Amplified Resist Process ..:

Kozawa, Takahiro ; Tagawa, Seiichi ; Ohnishi, Ryuji..
Japanese Journal of Applied Physics.  50 (2011)  1R - p. 016504 , 2011
Link: https://doi.org/10.7567/..
 
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11

Bottom-Anti-Reflective Coatings (BARC) for LFLE Double Patt..:

Sakamoto, Rikimaru ; Endo, Takafumi ; Ho, Banghing...
ECS Transactions.  27 (2010)  1 - p. 479-487 , 2010
Link: https://doi.org/10.1149/..
 
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12

A Cost Effective Spin on Sidewall Material Alternative to t..:

Ho, Bang-Ching ; Maruyama, Daisuke ; Sakamoto, Rikimaru.
ECS Transactions.  18 (2009)  1 - p. 409-417 , 2009
Link: https://doi.org/10.1149/..
 
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13

Organic Underlayers for EUV Lithography:

Guerrero, Dougllas J. ; Beaman, Carol ; Sakamoto, Rikimaru..
Journal of Photopolymer Science and Technology.  21 (2008)  3 - p. 451-455 , 2008
Link: https://doi.org/10.2494/..
 
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14

Application of a New BARC Material for 157-nm Lithography:

Shigematu, Masato ; Irie, Shigeo ; Sakamoto, Rikimaru...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 665-670 , 2004
Link: https://doi.org/10.2494/..
 
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15

A Study of an Organic Bottom Antireflective Coating for 157..:

Irie, Shigeo ; Shigematsu, Masato ; Sakamoto, Rikimaru...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 565-572 , 2003
Link: https://doi.org/10.2494/..
 
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