Schuster, Jorg
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2

A Mechanical–Electrical Model to Describe the Negative Diff..:

Huber, Max ; Schuster, Jörg ; Schmidt, Oliver G...
physica status solidi (RRL) – Rapid Research Letters.  18 (2024)  5 - p. , 2024
 
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3

A Mechanical–Electrical Model to Describe the Negative Diff..:

Huber, Max ; Schuster, Jörg ; Schmidt, Oliver G...
physica status solidi (RRL) – Rapid Research Letters.  18 (2024)  5 - p. , 2024
 
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4

Film Growth from Particle Raytracing: A Simulation Method f..:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
 
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5

Multi-scale simulation of epitaxial processes:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
 
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6

Towards knowledge-enhanced process models for semiconductor..:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
 
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7

Modeling a Wet Wafer Surface Processing Chain:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
 
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8

Automatic Detection of Via Arrays in AFM Images for CMP Dis..:

, In: 2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM),
 
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9

"The beauty narcotic likes noises to relieve". Monika Rinck..:

, In: Monika Rinck; Kontemporär. Schriften zur deutschsprachigen Gegenwartsliteratur,
Schuster, Jörg - p. 187-195 , 2023
 
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10

Electronic structure simulation of thin silicon layers: Imp..:

Joseph, Thomas ; Fuchs, Florian ; Schuster, Jörg
Physica E: Low-dimensional Systems and Nanostructures.  146 (2023)  - p. 115522 , 2023
 
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12

Wie und wozu analysiert man Blogs? Überlegungen zwischen Di..:

, In: Germanistische Symposien; Digitale Literaturwissenschaft,
Schuster, Jörg - p. 201-228 , 2022
 
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14

Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A..:

Hu, Xiao ; Schuster, Jörg
The Journal of Physical Chemistry C.  126 (2022)  17 - p. 7410-7420 , 2022
 
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