Shiojima, Kenji
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4

Preface: Special issue on control of semiconductor interfac..:

Shiojima, Kenji ; Nakatsuka, Osamu ; Kita, Koji..
Materials Science in Semiconductor Processing.  158 (2023)  - p. 107386 , 2023
 
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Mapping of ultra-high-pressure annealed n-GaN Schottky cont..:

Imabayashi, Hiroki ; Shiojima, Kenji ; Kachi, Tetsu
Materials Science in Semiconductor Processing.  162 (2023)  - p. 107536 , 2023
 
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Mapping of contactless photoelectrochemical etched GaN Scho..:

Shiojima, Kenji ; Matsuda, Ryo ; Horikiri, Fumimasa...
Japanese Journal of Applied Physics.  61 (2022)  SC - p. SC1059 , 2022
 
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Estimation of uniformity in Schottky contacts between print..:

Shiojima, Kenji ; Kawasumi, Yuto ; Yasui, Yuto..
Japanese Journal of Applied Physics.  61 (2022)  8 - p. 086506 , 2022
 
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Characterization of peripheries of n-GaN Schottky contacts ..:

Imabayashi, Hiroki ; Yasui, Yuto ; Horikiri, Fumimasa...
Japanese Journal of Applied Physics.  62 (2022)  SA - p. SA1012 , 2022
 
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Effects of surface treatment and annealing for Au/Ni/n-GaN ..:

Shiojima, Kenji ; Tanaka, Ryo ; Takashima, Shinya..
Japanese Journal of Applied Physics.  60 (2021)  5 - p. 056503 , 2021
 
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Uniformity characterization of SiC, GaN, and α-Ga2O3Schottk..:

Shiojima, Kenji ; Kawasumi, Yuto ; Horikiri, Fumimasa...
Japanese Journal of Applied Physics.  60 (2021)  10 - p. 108003 , 2021
 
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Mapping of photo-electrochemical etched Ni/GaN Schottky con..:

Matsuda, Ryo ; Horikiri, Fumimasa ; Narita, Yoshinobu...
Japanese Journal of Applied Physics.  60 (2021)  SB - p. SBBD12 , 2021
 
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14

Preface:

Shiojima, Kenji ; Washio, Katsuyoshi ; Miyazaki, Seiichi.
Materials Science in Semiconductor Processing.  123 (2021)  - p. 105580 , 2021
 
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