Tak, Hyun Woo
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4

Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3..:

Hong, Jong Woo ; Cho, Hyun Min ; Jeong, Yu Gwang...
Materials Science in Semiconductor Processing.  160 (2023)  - p. 107395 , 2023
 
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5

Etched characteristics of nanoscale TiO2 using C4F8-based a..:

Hong, Jong Woo ; Kim, Yeon Hee ; Kim, Hee Ju...
Materials Science in Semiconductor Processing.  164 (2023)  - p. 107617 , 2023
 
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12

Selective etching of silicon nitride over silicon oxide usi..:

Lee, Won Oh ; Kim, Ki Hyun ; Kim, Doo San...
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC8983696/.  , 2022
 
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