E-LIB Suche - Ergebnisse für: Teschke, Marcel

1

Phase contrast imaging: a generalized perspective:

Teschke, Marcel ; Sinzinger, Stefan
Journal of the Optical Society of America A. 26 (2009) 4 - p. 1015 , 2009

Link: https://doi.org/10.1364/..

2

Application of an interferometric phase contrast method to ..:

Teschke, Marcel ; Heyer, Robert ; Fritzsche, Marco..
Applied Optics. 47 (2008) 14 - p. 2550 , 2008

Link: https://doi.org/10.1364/..

3

Novel approaches to the design of halftone masks for analog..:

Teschke, Marcel ; Sinzinger, Stefan
Applied Optics. 47 (2008) 26 - p. 4767 , 2008

Link: https://doi.org/10.1364/..

4

Modified phase contrast for recording of holographic optica..:

Teschke, Marcel ; Sinzinger, Stefan
Optics Letters. 32 (2007) 14 - p. 2067 , 2007

Link: https://doi.org/10.1364/..

5

Das interferometrische Phasenkontrastverfahren und seine An..:

Teschke, Marcel
https://nbn-resolving.org/urn:nbn:de:gbv:ilm1-2009000490. , 2010

Link: https://nbn-resolving.or..

6

Holographic lithography for continuous-relief diffractive o..:

Hoffmann, Meike ; Stoebenau, Sebastian ; Teschke, Marcel.
Information technology and electrical engineering - devices and systems, materials and technologies for the future -- 51. IWK, Internationales Wissenschaftliches Kolloquium. , 2009

Link: https://www.db-thueringe..

7

Das interferometrische Phasenkontrastverfahren und seine An..:

Teschke, Marcel , 2010

Link: http://nbn-resolving.de/..

8

Phase contrast imaging: a generalized perspective:

, In: Journal of the Optical Society of America

Teschke, Marcel. (2009) 4 - p. 1015-1021

Copies: Zentrale:Magazinturm-E02 15z phy 415 jc/991; Zentrale:Magazin Zs fe 5015

9

Novel approaches to the design of halftone masks for analog..:

, In: Applied optics / OSA, Optical Society of America

Teschke, Marcel. (2008) 26 - p. 4767-4776

Copies: Zentrale:Magazinturm-E02 15z phy 457 jc/503; Zentrale:Magazin Zs fb 2503

10

Application of an interferometric phase contrast method to ..:

, In: Applied optics / OSA, Optical Society of America

Heyer, Robert ; Fritzsche, Marco ; Stoebenau, Sebastian... (2008) 14 - p. 2550-2556

Copies: Zentrale:Magazinturm-E02 15z phy 457 jc/503; Zentrale:Magazin Zs fb 2503

11

Holographic lithography for continuous-relief diffractive o..:

, In: Information technology and electrical engineering - devices and systems, materials and technologies for the future / Faculty of Electrical and Information Technology, [Technische Universität Ilmenau. Hrsg.: Peter Scharff]

Stoebenau, Sebastian ; Hofmann, Meike ; Teschke, Marcel.. (2006) - p. 231-232

Copies: Zentrale:Magazin 01.R.9827