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Trinque, Brian S.
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1

Comparing Development Patterns in Asia:

Clark, Cal ; Roy, K.C ; Trinque, Brian S. , 2023
Link: https://doi.org/10.1515/..
 
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2

Penultimate effect in radical copolymerization of 2‐trifluo..:

Ito, Hiroshi ; Trinque, Brian C. ; Kasai, Paul.
Journal of Polymer Science Part A: Polymer Chemistry.  46 (2008)  5 - p. 1559-1565 , 2008
Link: https://doi.org/10.1002/..
 
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3

Formation of deprotected fuzzy blobs in chemically amplifie..:

Jones, Ronald L. ; Hu, Tengjiao ; Lin, Eric K....
Journal of Polymer Science Part B: Polymer Physics.  42 (2004)  17 - p. 3063-3069 , 2004
Link: https://doi.org/10.1002/..
 
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4

Vacuum-UV influenced design of polymers and dissolution inh..:

Trinque, Brian C. ; Chambers, Charles R. ; Osborn, Brian P....
Journal of Fluorine Chemistry.  122 (2003)  1 - p. 17-26 , 2003
Link: https://doi.org/10.1016/..
 
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5

The Evolution of Materials for the Photolithographic Proces:

Grant Willson, C. ; Trinque, Brian C.
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 621-627 , 2003
Link: https://doi.org/10.2494/..
 
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6

Direct Measurement of the Reaction Front in Chemically Ampl..:

Lin, Eric K. ; Soles, Christopher L. ; Goldfarb, Dario L....
Science.  297 (2002)  5580 - p. 372-375 , 2002
Link: https://doi.org/10.1126/..
 
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7

Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist A..:

Tran, Hoang V. ; Hung, Raymond J. ; Chiba, Takashi...
Macromolecules.  35 (2002)  17 - p. 6539-6549 , 2002
Link: https://doi.org/10.1021/..
 
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8

Direct Measurement of the Reaction Front in Chemically Ampl..:

Lin, Eric K. ; Soles, Christopher L. ; Goldfarb, Dario L....
Science.  297 (2002)  5580 - p. 372-375 , 2002
Link: https://www.jstor.org/st..
 
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9

Dissolution Inhibitors for 157 nm Lithography: A Progress R..:

Conley, Will ; Miller, Daniel ; Chambers, Charles...
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 613-617 , 2002
Link: https://doi.org/10.2494/..
 
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10

The Design of Resist Materials for 157nm Lithography:

Willson, C. Grant ; Trinque, Brian C. ; Osborn, Brian P....
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 583-590 , 2002
Link: https://doi.org/10.2494/..
 
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11

Fluoropolymer Resist Materials for 157nm Microlithography:

Tran, Hoang V. ; Hung, Raymond J. ; Chiba, Takashi...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 669-674 , 2001
Link: https://doi.org/10.2494/..
 
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12

157 nm Resist Materials: A Progress Report:

Chiba, Takashi ; Hung, Raymond J. ; Yamada, Shintaro...
Journal of Photopolymer Science and Technology.  13 (2000)  4 - p. 657-664 , 2000
Link: https://doi.org/10.2494/..
 
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