Triozon, F
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2

Advanced TCAD Modeling of HfO2-based ReRAM: Coupling Redox ..:

, In: 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Hirchaou, Y. ; Goes, W. ; Hylin, C.... - p. 333-336 , 2023
 
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3

Effect of doping on Al2O3/GaN MOS capacitance:

Rrustemi, B. ; Piotrowicz, C. ; Jaud, M-A....
Solid-State Electronics.  194 (2022)  - p. 108356 , 2022
 
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6

Performance assessment of BEOL-integrated HfO2-based ferroe..:

, In: 2020 IEEE Silicon Nanoelectronics Workshop (SNW),
Grenouillet, L. ; Francois, T. ; Coignus, J.... - p. 5-6 , 2020
 
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8

Impact of strain on access resistance in planar and nanowir..:

, In: 2017 Symposium on VLSI Technology,
Berthelon, R. ; Andneu, F. ; Triozon, F.... - p. T224-T225 , 2017
 
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13

Multi-scale strategy for high-k/metal-gate UTBB-FDSOI devic..:

Nier, O. ; Rideau, D. ; Niquet, Y. M....
Journal of Computational Electronics.  12 (2013)  4 - p. 675-684 , 2013
 
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