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Uchino, Shou-ichi
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1

Effect of Basic Additives on Acid-Catalyzed Electron-Beam N..:

Migitaka, Sonoko ; Yamamoto, Jiro ; Uchino, Shou-ichi...
Japanese Journal of Applied Physics.  39 (2000)  3R - p. 1387 , 2000
Link: https://doi.org/10.1143/..
 
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2

Negative Electron Beam Resists Using Ring-Chain Tautomerism..:

Uchino, Shou-ichi ; Kimura, Kaori
Journal of Photopolymer Science and Technology.  12 (1999)  2 - p. 359-364 , 1999
Link: https://doi.org/10.2494/..
 
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3

Structural Design of Resin Matrix and Acid-labile Dissoluti..:

Sakamizu, Toshio ; Arai, Tadasi ; Katoh, Kohji...
Journal of Photopolymer Science and Technology.  11 (1998)  4 - p. 547-552 , 1998
Link: https://doi.org/10.2494/..
 
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4

Negative EB Resist Materials Using Anisotropic Acid-Diffusi..:

Uchino, Shou-ichi ; Yamamoto, Jiro ; Migitaka, Sonoko...
Journal of Photopolymer Science and Technology.  11 (1998)  4 - p. 555-563 , 1998
Link: https://doi.org/10.2494/..
 
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5

Effects of Molecular-Weight Distributions of Resist Polymer..:

Yoshimura, Toshiyuki ; Yamamoto, Jiro ; Shiraishi, Hiroshi...
Journal of Photopolymer Science and Technology.  10 (1997)  4 - p. 629-634 , 1997
Link: https://doi.org/10.2494/..
 
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6

Contrast Boosted Resist Using Base-Labile Compound for Elec..:

Uchino, Shou-ichi ; Migitaka, Sonoko ; Yamamoto, Jiro...
Journal of Photopolymer Science and Technology.  10 (1997)  3 - p. 377-378 , 1997
Link: https://doi.org/10.2494/..
 
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7

Nanometer Electron Beam Lithography with Azide-PhenolicResi..:

Yamamoto, Jiro ; Uchino, Shou-ichi ; Hattori, Takashi..
Japanese Journal of Applied Physics.  35 (1996)  12S - p. 6511 , 1996
Link: https://doi.org/10.1143/..
 
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8

Nanofabrication with a Novel EB System with a Large and Sta..:

Yoshimura, Toshiyuki ; Ohta, Hiroya ; Yamamoto, Jiro...
Japanese Journal of Applied Physics.  35 (1996)  12S - p. 6421 , 1996
Link: https://doi.org/10.1143/..
 
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9

Prevention of Resist Pattern Collapse by Flood Exposure dur..:

Tanaka, Toshihiko ; Morigami, Mitsuaki ; Oizumi, Hiroaki..
Japanese Journal of Applied Physics.  33 (1994)  12B - p. L1803 , 1994
Link: https://doi.org/10.1143/..
 
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10

Chemically amplified negative resists using acid-catalyzed ..:

Uchino, Shou-ichi ; Katoh, Midori ; Sakamizu, Toshio.
Microelectronic Engineering.  18 (1992)  4 - p. 341-351 , 1992
Link: https://doi.org/10.1016/..
 
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11

The Inhibitory Effects of Cephalosporin and Dipeptide on Ce..:

Sugawara, Mitsuru ; Toda, Takaki ; Kobayashi, Michiya...
Journal of Pharmacy and Pharmacology.  46 (2011)  8 - p. 680-684 , 2011
Link: https://doi.org/10.1111/..
 
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12

Transport Characteristics of Cephalosporin Antibiotics Acro..:

Sugawara, Mitsuru ; Toda, Takaki ; Iseki, Ken...
Journal of Pharmacy and Pharmacology.  44 (2011)  12 - p. 968-972 , 2011
Link: https://doi.org/10.1111/..
 
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13

Transport characteristics of ceftibuten, cefixime and cepha..:

Sugawara, Mitsuru ; Iseki, Ken ; Miyazaki, Katsumi...
Journal of Pharmacy and Pharmacology.  43 (2011)  12 - p. 882-884 , 2011
Link: https://doi.org/10.1111/..
 
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14

Fine Pattern Fabrication below 100 nm with 70 kV Cell Proje..:

Yamamoto, Jiro ; Murai, Fumio ; Someda, Yasuhiro.
Japanese Journal of Applied Physics.  39 (2000)  12S - p. 6854 , 2000
Link: https://doi.org/10.1143/..
 
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15

Treatment Results of Advanced Neuroblastoma With the First ..:

Kaneko, Michio ; Tsuchida, Yoshiaki ; Uchino, Jun-ichi...
Journal of Pediatric Hematology/Oncology.  21 (1999)  3 - p. 190-197 , 1999
Link: https://doi.org/10.1097/..
 
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