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Uchino, Shou-ichi
63
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1
Effect of Basic Additives on Acid-Catalyzed Electron-Beam N..:
Migitaka, Sonoko
;
Yamamoto, Jiro
;
Uchino, Shou-ichi
...
Japanese Journal of Applied Physics. 39 (2000) 3R - p. 1387 , 2000
Link:
https://doi.org/10.1143/..
?
2
Negative Electron Beam Resists Using Ring-Chain Tautomerism..:
Uchino, Shou-ichi
;
Kimura, Kaori
Journal of Photopolymer Science and Technology. 12 (1999) 2 - p. 359-364 , 1999
Link:
https://doi.org/10.2494/..
?
3
Structural Design of Resin Matrix and Acid-labile Dissoluti..:
Sakamizu, Toshio
;
Arai, Tadasi
;
Katoh, Kohji
...
Journal of Photopolymer Science and Technology. 11 (1998) 4 - p. 547-552 , 1998
Link:
https://doi.org/10.2494/..
?
4
Negative EB Resist Materials Using Anisotropic Acid-Diffusi..:
Uchino, Shou-ichi
;
Yamamoto, Jiro
;
Migitaka, Sonoko
...
Journal of Photopolymer Science and Technology. 11 (1998) 4 - p. 555-563 , 1998
Link:
https://doi.org/10.2494/..
?
5
Effects of Molecular-Weight Distributions of Resist Polymer..:
Yoshimura, Toshiyuki
;
Yamamoto, Jiro
;
Shiraishi, Hiroshi
...
Journal of Photopolymer Science and Technology. 10 (1997) 4 - p. 629-634 , 1997
Link:
https://doi.org/10.2494/..
?
6
Contrast Boosted Resist Using Base-Labile Compound for Elec..:
Uchino, Shou-ichi
;
Migitaka, Sonoko
;
Yamamoto, Jiro
...
Journal of Photopolymer Science and Technology. 10 (1997) 3 - p. 377-378 , 1997
Link:
https://doi.org/10.2494/..
?
7
Nanometer Electron Beam Lithography with Azide-PhenolicResi..:
Yamamoto, Jiro
;
Uchino, Shou-ichi
;
Hattori, Takashi
..
Japanese Journal of Applied Physics. 35 (1996) 12S - p. 6511 , 1996
Link:
https://doi.org/10.1143/..
?
8
Nanofabrication with a Novel EB System with a Large and Sta..:
Yoshimura, Toshiyuki
;
Ohta, Hiroya
;
Yamamoto, Jiro
...
Japanese Journal of Applied Physics. 35 (1996) 12S - p. 6421 , 1996
Link:
https://doi.org/10.1143/..
?
9
Prevention of Resist Pattern Collapse by Flood Exposure dur..:
Tanaka, Toshihiko
;
Morigami, Mitsuaki
;
Oizumi, Hiroaki
..
Japanese Journal of Applied Physics. 33 (1994) 12B - p. L1803 , 1994
Link:
https://doi.org/10.1143/..
?
10
Chemically amplified negative resists using acid-catalyzed ..:
Uchino, Shou-ichi
;
Katoh, Midori
;
Sakamizu, Toshio
.
Microelectronic Engineering. 18 (1992) 4 - p. 341-351 , 1992
Link:
https://doi.org/10.1016/..
?
11
The Inhibitory Effects of Cephalosporin and Dipeptide on Ce..:
Sugawara, Mitsuru
;
Toda, Takaki
;
Kobayashi, Michiya
...
Journal of Pharmacy and Pharmacology. 46 (2011) 8 - p. 680-684 , 2011
Link:
https://doi.org/10.1111/..
?
12
Transport Characteristics of Cephalosporin Antibiotics Acro..:
Sugawara, Mitsuru
;
Toda, Takaki
;
Iseki, Ken
...
Journal of Pharmacy and Pharmacology. 44 (2011) 12 - p. 968-972 , 2011
Link:
https://doi.org/10.1111/..
?
13
Transport characteristics of ceftibuten, cefixime and cepha..:
Sugawara, Mitsuru
;
Iseki, Ken
;
Miyazaki, Katsumi
...
Journal of Pharmacy and Pharmacology. 43 (2011) 12 - p. 882-884 , 2011
Link:
https://doi.org/10.1111/..
?
14
Fine Pattern Fabrication below 100 nm with 70 kV Cell Proje..:
Yamamoto, Jiro
;
Murai, Fumio
;
Someda, Yasuhiro
.
Japanese Journal of Applied Physics. 39 (2000) 12S - p. 6854 , 2000
Link:
https://doi.org/10.1143/..
?
15
Treatment Results of Advanced Neuroblastoma With the First ..:
Kaneko, Michio
;
Tsuchida, Yoshiaki
;
Uchino, Jun-ichi
...
Journal of Pediatric Hematology/Oncology. 21 (1999) 3 - p. 190-197 , 1999
Link:
https://doi.org/10.1097/..
1-15