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Umemoto Hironobu
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1

Photoactive Compounds Effects on Removal Rate for Polystyre..:

Yamamoto, Masashi ; Akita, Koki ; Maniwa, Tomohiro...
Journal of Photopolymer Science and Technology.  36 (2023)  5 - p. 283-290 , 2023
Link: https://doi.org/10.2494/..
 
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2

Removal of Novolac Photoresist with Various Concentrations ..:

Akita, Koki ; Sogo, Shota ; Sogame, Ryusei...
Journal of Photopolymer Science and Technology.  34 (2021)  5 - p. 499-504 , 2021
Link: https://doi.org/10.2494/..
 
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3

Effects of Nitrogen Dilution on the Photoresist Removal Rat..:

Yamamoto, Masashi ; Nishioka, Hiroto ; Akita, Koki...
Journal of Photopolymer Science and Technology.  33 (2020)  4 - p. 427-431 , 2020
Link: https://doi.org/10.2494/..
 
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4

Evaluation of Decomposition Property of Photoresist by Oxyg..:

Yamamoto, Masashi ; Akita, Koki ; Nagaoka, Shiro..
Journal of Photopolymer Science and Technology.  33 (2020)  4 - p. 433-437 , 2020
Link: https://doi.org/10.2494/..
 
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5

Oxygen additive effects on decomposition rate of poly(vinyl..:

Yamamoto, Masashi ; Nagaoka, Shiro ; Ohdaira, Keisuke..
Thin Solid Films.  679 (2019)  - p. 22-26 , 2019
Link: https://doi.org/10.1016/..
 
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6

Mitochondrial DNA diversity and geographical distribution o..:

Fujie, Shunpei ; Wachi, Nakatada ; Umemoto, Hironobu.
Entomologia Experimentalis et Applicata.  167 (2019)  12 - p. 977-985 , 2019
Link: https://doi.org/10.1111/..
 
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7

Relationship between Oxygen Additive Amount and Photoresist..:

Yamamoto, Masashi ; Shiroi, Tomohiro ; Shikama, Tomokazu...
Journal of Photopolymer Science and Technology.  32 (2019)  4 - p. 609-614 , 2019
Link: https://doi.org/10.2494/..
 
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8

Removal of Polymers for KrF and ArF Photoresist Using Hydro..:

Yamamoto, Masashi ; Taki, Tomohiro ; Sunada, Takuto...
Journal of Photopolymer Science and Technology.  31 (2018)  3 - p. 419-424 , 2018
Link: https://doi.org/10.2494/..
 
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9

Pressure Dependence of Photoresist Removal Rate Using Hydro..:

Yamamoto, Masashi ; Shiroi, Tomohiro ; Nagaoka, Shiro...
Journal of Photopolymer Science and Technology.  30 (2017)  3 - p. 297-301 , 2017
Link: https://doi.org/10.2494/..
 
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10

Photoresist Removal Using H Radicals Generated by Iridium H..:

Yamamoto, Masashi ; Nagaoka, Shiro ; Umemoto, Hironobu...
International Journal of Polymer Science.  2017 (2017)  - p. 1-5 , 2017
Link: https://doi.org/10.1155/..
 
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11

Hot metal wires as sinks and sources of B atoms:

Umemoto, Hironobu ; Miyata, Atsushi
Thin Solid Films.  635 (2017)  - p. 78-81 , 2017
Link: https://doi.org/10.1016/..
 
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12

Decomposition processes of photoresist polymers by H atoms ..:

Umemoto, Hironobu ; Kato, Teruto ; Takiguchi, Masayuki..
Thin Solid Films.  635 (2017)  - p. 27-31 , 2017
Link: https://doi.org/10.1016/..
 
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13

Enhancement of Removal Uniformity by Oxygen Addition for Ph..:

Yamamoto, Masashi ; Maejima, Kazuma ; Umemoto, Hironobu...
Journal of Photopolymer Science and Technology.  29 (2016)  4 - p. 639-642 , 2016
Link: https://doi.org/10.2494/..
 
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14

A Clean Source of B atoms without Using Explosive Boron Com..:

Umemoto, Hironobu ; Miyata, Atsushi
Bulletin of the Chemical Society of Japan.  89 (2016)  8 - p. 899-901 , 2016
Link: https://doi.org/10.1246/..
 
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15

Oxygen additive amount dependence of rate of photoresist re..:

Yamamoto, Masashi ; Umemoto, Hironobu ; Ohdaira, Keisuke...
Japanese Journal of Applied Physics.  55 (2016)  7 - p. 076503 , 2016
Link: https://doi.org/10.7567/..
 
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