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2012 12th International Workshop on Junction Technology ,
2
Phosphorous transient enhanced diffusion suppression with c..:
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2010 International Workshop on Junction Technology Extended Abstracts ,
3
Suppression of phosphorus diffusion using cluster Carbon co..:
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2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ,
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Effects of cluster carbon implantation at low temperature o..:
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2010 International Workshop on Junction Technology Extended Abstracts ,
5
Improvement of productivity by cluster ion implanter: CLARI:
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2008 9th International Conference on Solid-State and Integrated-Circuit Technology ,
7
Ion implantation technology and system for beyond 45nm node..:
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2007 International Workshop on Junction Technology ,
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