Umisedo, Sei
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2

Phosphorous transient enhanced diffusion suppression with c..:

, In: 2012 12th International Workshop on Junction Technology,
 
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3

Suppression of phosphorus diffusion using cluster Carbon co..:

, In: 2010 International Workshop on Junction Technology Extended Abstracts,
 
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4

Effects of cluster carbon implantation at low temperature o..:

, In: 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP),
 
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5

Improvement of productivity by cluster ion implanter: CLARI:

, In: 2010 International Workshop on Junction Technology Extended Abstracts,
 
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7

Ion implantation technology and system for beyond 45nm node..:

, In: 2008 9th International Conference on Solid-State and Integrated-Circuit Technology,
 
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8

Development of Nissin new boron cluster ion implanter:

, In: 2007 International Workshop on Junction Technology,
Hamamoto, Nariaki ; Umisedo, Sei ; Koga, Yuji... - p. None , 2007
 
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9

Decaborane implantation with the medium current implanter:

Hamamoto, Nariaki ; Umisedo, Sei ; Nagayama, Tsutomu...
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  237 (2005)  1-2 - p. 443-448 , 2005
 
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