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Urabe, Keiichiro
91
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Online (91)
Mediatypes
Articles (Online) (70)
Bookchapter (Online) (1)
OpenAccess-fulltext (20)
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?
1
Optical and electrical evaluation methods of plasma-induced..:
Goya, Takahiro
;
Urabe, Keiichiro
;
Eriguchi, Koji
Japanese Journal of Applied Physics. 63 (2024) 6 - p. 06SP04 , 2024
Link:
https://doi.org/10.35848..
?
2
Time-resolved laser-induced fluorescence spectroscopy using..:
Takahashi, Ryosuke
;
Kito, Seiya
;
Eriguchi, Koji
.
Review of Scientific Instruments. 95 (2024) 5 - p. , 2024
Link:
https://doi.org/10.1063/..
?
3
Study on Ion Flux From Magnetically Confined Low-Pressure A..:
Asamoto, Yuya
;
Urabe, Keiichiro
;
Matsuda, Takayuki
...
IEEE Transactions on Plasma Science. , 2024
Link:
https://doi.org/10.1109/..
?
4
Investigation of small-fraction molecular impurities in hig..:
Urabe, Keiichiro
;
Toyoda, Minami
;
Matsuoka, Yoshinori
.
Plasma Sources Science and Technology. 33 (2024) 2 - p. 025011 , 2024
Link:
https://doi.org/10.1088/..
?
5
In situ electrical monitoring of SiO2/Si structures in low-..:
Morozumi, Junki
;
Goya, Takahiro
;
Kuyama, Tomohiro
..
Japanese Journal of Applied Physics. 62 (2023) SI - p. SI1010 , 2023
Link:
https://doi.org/10.35848..
?
6
Spectroscopic ellipsometry characterization of boron nitrid..:
Hamano, Takashi
;
Matsuda, Takayuki
;
Asamoto, Yuya
...
Applied Physics Letters. 120 (2022) 3 - p. , 2022
Link:
https://doi.org/10.1063/..
?
7
Characterization of Plasma Process-Induced Low-Density Defe..:
Sato, Yoshihiro
;
Shibata, Satoshi
;
Yamada, Takayoshi
...
IEEE Journal of the Electron Devices Society. 10 (2022) - p. 769-777 , 2022
Link:
https://doi.org/10.1109/..
?
8
Quantitative evaluation of plasma-damaged SiN/Si structures..:
Kuyama, Tomohiro
;
Urabe, Keiichiro
;
Eriguchi, Koji
Journal of Applied Physics. 131 (2022) 13 - p. , 2022
Link:
https://doi.org/10.1063/..
?
9
Multi-harmonic analysis in a floating harmonic probe method..:
Kito, Seiya
;
Urabe, Keiichiro
;
Eriguchi, Koji
Japanese Journal of Applied Physics. 61 (2022) 10 - p. 106002 , 2022
Link:
https://doi.org/10.35848..
?
10
Electron number density measurements in nanosecond repetiti..:
Sainct, Florent P
;
Urabe, Keiichiro
;
Pannier, Erwan
..
Plasma Sources Science and Technology. 29 (2020) 2 - p. 025017 , 2020
Link:
https://doi.org/10.1088/..
?
11
Characterization of dynamic behaviors of defects in Si subs..:
Kuyama, Tomohiro
;
Urabe, Keiichiro
;
Fukawsawa, Masanaga
..
Japanese Journal of Applied Physics. 59 (2020) SJ - p. SJJC02 , 2020
Link:
https://doi.org/10.35848..
?
12
5 Model analysis for effects of spatial and energy profiles..:
, In:
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
,
Hamano, Takashi
;
Urabe, Keiichiro
;
Eriguchi, Koji
- p. 125-127 , 2020
Link:
https://doi.org/10.23919..
?
13
Characterization of surface modification mechanisms for bor..:
Higuchi, Tomoya
;
Noma, Masao
;
Yamashita, Michiru
...
Surface and Coatings Technology. 377 (2019) - p. 124854 , 2019
Link:
https://doi.org/10.1016/..
?
14
Improvement of the plasma‐induced defect generation model i..:
Eriguchi, Koji
;
Hamano, Takashi
;
Urabe, Keiichiro
Plasma Processes and Polymers. 16 (2019) 9 - p. , 2019
Link:
https://doi.org/10.1002/..
?
15
Investigation of spatial and energy profiles of plasma proc..:
Hamano, Takashi
;
Urabe, Keiichiro
;
Eriguchi, Koji
Journal of Physics D: Applied Physics. , 2019
Link:
https://doi.org/10.1088/..
1-15