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Vandentop, Gilroy J.
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EUV Resist Testing Status and Post Lithography LWR Reductio:

Vandentop, Gilroy J. ; Putna, E. Steve ; Leeson, Micahel J....
Journal of Photopolymer Science and Technology.  24 (2011)  2 - p. 127-136 , 2011
Link: https://doi.org/10.2494/..
 
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Innovative Architecture of Thermal Solution for Microproces..:

Hu, Chuan ; Lu, Daniel D. ; Vandentop, Gilroy J.
Japanese Journal of Applied Physics.  48 (2009)  5S2 - p. 05EA02 , 2009
Link: https://doi.org/10.1143/..
 
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