Wakabayashi, Hitoshi
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1

Impact of crystallinity on thermal conductivity of RF magne..:

Kitazawa, Tatsuya ; Inaba, Yuta ; Yamashita, Shunsuke...
Japanese Journal of Applied Physics.  63 (2024)  5 - p. 055508 , 2024
 
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2

Reactive sputtering of ferroelectric AlScN films with H2 ga..:

Chen, Si-Meng ; Hoshii, Takuya ; Wakabayashi, Hitoshi...
Japanese Journal of Applied Physics.  63 (2024)  3 - p. 03SP45 , 2024
 
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4

High quality PVD-MoS2 film on plasma-ALD-SiO2 underlaying m..:

, In: 2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM),
 
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6

Reduction of contact resistance to PVD-MoS₂ film using alum..:

, In: 2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM),
 
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7

Improved electrical characteristics of 4H-SiC (0001) MOS de..:

Li, An ; Hoshii, Takuya ; Tsutsui, Kazuo..
Japanese Journal of Applied Physics.  63 (2024)  6 - p. 066503 , 2024
 
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8

Conductivity Enhancement of PVD-WS2 Films Using Cl2-Plasma ..:

Kurohara, Keita ; Imai, Shinya ; Hamada, Takuya...
IEEE Journal of the Electron Devices Society.  12 (2024)  - p. 390-398 , 2024
 
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10

Doping-Free Complementary Metal-Oxide-Semiconductor Inverte..:

Kawanago, Takamasa ; Kajikawa, Ryosuke ; Mizutani, Kazuto...
IEEE Journal of the Electron Devices Society.  11 (2023)  - p. 15-21 , 2023
 
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11

Improvement of MoS2 Film Quality by Solid-Phase Crystalliza..:

, In: 2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM),
Ono, Ryo ; Imai, Shinya ; Kawanago, Takamasa... - p. 1-3 , 2023
 
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12

Sheet Resistance Reduction of Sputtered WS2 Film by Cl2 Pla..:

, In: 2023 21st International Workshop on Junction Technology (IWJT),
 
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13

Chemical states of PVD-ZrS2 film underneath scaled high-k f..:

Otomo, Masaki ; Hamada, Masaya ; Ono, Ryo...
Japanese Journal of Applied Physics.  62 (2023)  SC - p. SC1015 , 2023
 
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15

Field cycling behavior and breakdown mechanism of ferroelec..:

Tsai, Sung-Lin ; Hoshii, Takuya ; Wakabayashi, Hitoshi...
Japanese Journal of Applied Physics.  61 (2022)  SJ - p. SJ1005 , 2022
 
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