Wu, Kehuey
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Stacked Ge Nanosheet GAAFETs Fabrication and Strain Effects..:

, In: 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA),
Chu, Chun-Lin ; Luo, Guang-Li ; Wu, Kehuey... - p. 128-129 , 2020
 
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