Yasuda, Masaaki
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1

The Development of Bile Duct Stent Having Antifouling Prope..:

Sekiguchi, Atsushi ; Yamamoto, Masashi ; Aikawa, Masayasu..
Journal of Photopolymer Science and Technology.  37 (2024)  4 - p. 371-378 , 2024
 
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2

Stochastic Simulation Study of Pattern Formation in EUV res..:

Imai, Kyohei ; Inoue, Bunta ; Hirai, Yoshihiko.
Journal of Photopolymer Science and Technology.  37 (2024)  1 - p. 109-114 , 2024
 
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3

The Patterned Photosensitive Dielectric Organic Material/Cu..:

, In: 2024 IEEE 74th Electronic Components and Technology Conference (ECTC),
Tanaka, Toshiaki ; Nishizawa, Hideaki ; Ozono, Mitsuru... - p. 1347-1353 , 2024
 
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4

Molecular Dynamics Simulation of Pattern Formation for Nega..:

Yamada, Kaito ; Hirai, Yoshihiko ; Yasuda, Masaaki
Journal of Photopolymer Science and Technology.  37 (2024)  1 - p. 75-79 , 2024
 
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6

Developing a Laparoscope Lens with Super Water-Repellent An..:

Sekiguchi, Atsushi ; Minami, Hiroko ; Yasuda, Masaaki.
Journal of Photopolymer Science and Technology.  36 (2023)  3 - p. 173-182 , 2023
 
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8

Proposal of hybrid deep learning systems for process and ma..:

Tsukamoto, Sou ; Tanabe, Hidekatsu ; Yamamura, Ryuhei...
Journal of Photopolymer Science and Technology.  34 (2021)  2 - p. 145-148 , 2021
 
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9

Computational Lithography for 3-Dimensional Fine Photolitho..:

Osumi, Tomoaki ; Misaka, Akio ; Sato, Kousuke...
Journal of Photopolymer Science and Technology.  34 (2021)  2 - p. 123-126 , 2021
 
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10

Effects of acid diffusion and resist molecular size on line..:

Koyama, Masanori ; Imai, Kyohei ; Shirai, Masamitsu..
Japanese Journal of Applied Physics.  60 (2021)  10 - p. 106505 , 2021
 
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11

Stochastic Simulation of Development Process in Electron Be..:

Inoue, Bunta ; Koyama, Masanori ; Sekiguchi, Atsushi...
Journal of Photopolymer Science and Technology.  34 (2021)  6 - p. 661-665 , 2021
 
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12

Stochastic Simulation of Pattern Formation for Negative-Typ..:

Yasuda, Masaaki ; Koyama, Masanori ; Imai, Kyohei...
Journal of Photopolymer Science and Technology.  33 (2020)  1 - p. 53-56 , 2020
 
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13

Fabrication of Nickel Plasma Etching Mask by Nano-Imprint L..:

Shimizu, Shingo ; Tanabe, Hideki ; Yasuda, Masaaki..
Journal of Photopolymer Science and Technology.  33 (2020)  5 - p. 551-556 , 2020
 
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14

Stochastic simulation of pattern formation for chemically a..:

Koyama, Masanori ; Shirai, Masamitsu ; Kawata, Hiroaki..
Japanese Journal of Applied Physics.  58 (2019)  SD - p. SDDB01 , 2019
 
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15

Computational Study of Pattern Formation for Chemically Amp..:

Yasuda, Masaaki ; Koyama, Masanori ; Fukunari, Kosai...
Journal of Photopolymer Science and Technology.  32 (2019)  2 - p. 339-343 , 2019
 
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