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Yeom, Geun Young
1343
results:
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Online (1342)
Print (1)
Mediatypes
Books (1)
Articles (Online) (1272)
Bookchapter (Online) (28)
OpenAccess-fulltext (42)
Languages
english (1220)
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1
Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer..:
Lee, Jin Woong
;
Lee, Byoungsang
;
Park, Cheol Hyun
...
Advanced Materials. , 2024
Link:
https://doi.org/10.1002/..
?
2
Semi-Metal Edge Contact for Barrier-Free Carrier Transport ..:
Lee, Sungwon
;
Wang, Xinbiao
;
Shin, Hoseong
...
ACS Applied Electronic Materials. , 2024
Link:
https://doi.org/10.1021/..
?
3
Characteristics of clean SiO2 atomic layer etching based on..:
Sung, Da In
;
Tak, Hyun Woo
;
Kim, Hee Ju
..
Applied Surface Science. 670 (2024) - p. 160574 , 2024
Link:
https://doi.org/10.1016/..
?
4
Plasma enhanced atomic layer deposition of silicon nitride ..:
Ji, You Jin
;
Kim, Hae In
;
Kang, Ji Eun
...
Nanotechnology. 35 (2024) 27 - p. 275701 , 2024
Link:
https://doi.org/10.1088/..
?
5
Enhancement of photosensitivity and stability of Sn-12 EUV ..:
Kang, Yeo Kyung
;
Kim, Heeju
;
Lee, Sun Jin
...
Applied Surface Science. 656 (2024) - p. 159564 , 2024
Link:
https://doi.org/10.1016/..
?
6
Plasma atomic layer etching of ruthenium by oxygen adsorpti..:
Kim, Doo San
;
Kwon, Hae In
;
Jang, Yun Jong
...
Applied Surface Science. 670 (2024) - p. 160570 , 2024
Link:
https://doi.org/10.1016/..
?
7
Selective isotropic etching of SiO2 over Si3N4 using NF3/H2..:
Gil, Hong Seong
;
Kim, Doo San
;
Jang, Yun Jong
...
Scientific Reports. 13 (2023) 1 - p. , 2023
Link:
https://doi.org/10.1038/..
?
8
Characterization of SiO2 Plasma Etching with Perfluorocarbo..:
Choi, Minsu
;
Lee, Youngseok
;
You, Yebin
...
Materials. 16 (2023) 16 - p. 5624 , 2023
Link:
https://doi.org/10.3390/..
?
9
Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3..:
Hong, Jong Woo
;
Cho, Hyun Min
;
Jeong, Yu Gwang
...
Materials Science in Semiconductor Processing. 160 (2023) - p. 107395 , 2023
Link:
https://doi.org/10.1016/..
?
10
Effect of various pulse plasma techniques on TiO2 etching f..:
Hong, Jong Woo
;
Kim, Yeon Hee
;
Kim, Hee Ju
...
Vacuum. 212 (2023) - p. 111978 , 2023
Link:
https://doi.org/10.1016/..
?
11
Non-epitaxial single-crystal 2D material growth by geometri..:
Kim, Ki Seok
;
Lee, Doyoon
;
Chang, Celesta S.
...
Nature. 614 (2023) 7946 - p. 88-94 , 2023
Link:
https://doi.org/10.1038/..
?
12
Etched characteristics of nanoscale TiO2 using C4F8-based a..:
Hong, Jong Woo
;
Kim, Yeon Hee
;
Kim, Hee Ju
...
Materials Science in Semiconductor Processing. 164 (2023) - p. 107617 , 2023
Link:
https://doi.org/10.1016/..
?
13
Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscal..:
Kim, Hee Ju
;
Yeom, Geun Young
ACS Applied Nano Materials. 6 (2023) 12 - p. 10097-10105 , 2023
Link:
https://doi.org/10.1021/..
?
14
High-throughput manufacturing of epitaxial membranes from a..:
Kim, Hyunseok
;
Liu, Yunpeng
;
Lu, Kuangye
...
Nature Nanotechnology. 18 (2023) 5 - p. 464-470 , 2023
Link:
https://doi.org/10.1038/..
?
15
Surface hardening of extreme ultraviolet(EUV) photoresist b..:
Chang, Won Jun
;
Kim, Hee Ju
;
Yeom, Geun Young
Applied Surface Science. 629 (2023) - p. 157439 , 2023
Link:
https://doi.org/10.1016/..
1-15