E-LIB Suche - Ergebnisse für: Yerriboina, Nagendra Prasad

1

Acoustic power dependent detachment of PSL particles adhere..:

Sahoo, Bichitra Nanda ; Yerriboina, Nagendra Prasad ; Kang, Bong-kyun...
Colloids and Surfaces A: Physicochemical and Engineering Aspects. 671 (2023) - p. 131681 , 2023

Link: https://doi.org/10.1016/..

2

Particle Removal by Surfactants During Semiconductor Cleani..:

, In: Surfactants in Precision Cleaning,

Yerriboina, Nagendra Prasad ; Poddar, Maneesh Kumar ; Park, Jin-Goo - p. 161-191 , 2022

Link: https://doi.org/10.1016/..

3

Chemically controlled megasonic cleaning of patterned struc..:

Sahoo, Bichitra Nanda ; Han, So Young ; Kim, Hyun-Tae...
Ultrasonics Sonochemistry. 82 (2022) - p. 105859 , 2022

Link: https://doi.org/10.1016/..

4

Theoretical validation of inhibition mechanisms of benzotri..:

Ryu, Heon-Yul ; Lee, Chi Ho ; Lee, Sang Uck...
Microelectronic Engineering. 262 (2022) - p. 111833 , 2022

Link: https://doi.org/10.1016/..

5

List of Contributors:

, In: Surfactants in Precision Cleaning,

Agrawal, Daksh ; Antoniswamy, Aravindha ; Awad, Nadia F.... - p. xi , 2022

Link: https://doi.org/10.1016/..

6

Study on PVA Brush Loading and Conditioning during Shallow ..:

Sahir, Samrina ; Cho, Hwi-Won ; Kim, Tae-Gon...
ECS Journal of Solid State Science and Technology. 11 (2022) 2 - p. 024004 , 2022

Link: https://doi.org/10.1149/..

7

Contributors:

, In: Advances in Chemical Mechanical Planarization (CMP),

Aida, H. ; Baisie, E.A. ; Boning, D.... - p. xi-xiii , 2022

Link: https://doi.org/10.1016/..

8

Latest developments in the understanding of PVA brush relat..:

, In: Advances in Chemical Mechanical Planarization (CMP),

Yerriboina, Nagendra Prasad ; Park, Jin-Goo - p. 591-627 , 2022

Link: https://doi.org/10.1016/..

9

Tungsten passivation layer (WO3) formation mechanisms durin..:

Poddar, Maneesh Kumar ; Jalalzai, Palwasha ; Sahir, Samrina...
Applied Surface Science. 537 (2021) - p. 147862 , 2021

Link: https://doi.org/10.1016/..

10

Investigation of the effect of different cleaning forces on..:

Sahir, Samrina ; Yerriboina, Nagendra Prasad ; Han, So-Young...
Applied Surface Science. 545 (2021) - p. 149035 , 2021

Link: https://doi.org/10.1016/..

11

Mechanisms of colloidal ceria contamination and cleaning du..:

Sahir, Samrina ; Yerriboina, Nagendra Prasad ; Han, So-Young...
Microelectronic Engineering. 241 (2021) - p. 111544 , 2021

Link: https://doi.org/10.1016/..

12

Comparative evaluation of organic contamination sources fro..:

Lee, Jung-Hwan ; Poddar, Maneesh Kumar ; Han, Kwang-Min...
Polymer Testing. 90 (2020) - p. 106669 , 2020

Link: https://doi.org/10.1016/..

13

Hybrid DHF and N2 jet spray cleaning for silicon nitride an..:

An, Kook-Hyun ; Yerriboina, Nagendra Prasad ; Poddar, Maneesh Kumar...
Microelectronic Engineering. 220 (2020) - p. 111171 , 2020

Link: https://doi.org/10.1016/..

14

Contamination Mechanism of Ceria Particles on the Oxide Sur..:

Han, Kwang-Min ; Han, So-Young ; Sahir, Samrina...
ECS Journal of Solid State Science and Technology. 9 (2020) 12 - p. 124004 , 2020

Link: https://doi.org/10.1149/..

15

The Adsorption and Removal of Corrosion Inhibitors During M..:

, In: 2020 China Semiconductor Technology International Conference (CSTIC),

Park, Jin-Goo ; Ryu, Heon-Yul ; Kim, Tae-Gon... - p. 1-3 , 2020

Link: https://doi.org/10.1109/..