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Zographos, Nikolas
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Online (19)
Mediatypes
Articles (Online) (18)
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1
Accurate and efficient 3D analytic ion implantation model b..:
Terterian, Arsen
;
Zographos, Nikolas
;
Tian, Shiyang
..
Materials Science in Semiconductor Processing. 169 (2024) - p. 107933 , 2024
Link:
https://doi.org/10.1016/..
?
2
Technology Computer‐Aided Design Model for SiGe Oxidation a..:
Zechner, Christoph
;
Zographos, Nikolas
physica status solidi (a). , 2024
Link:
https://doi.org/10.1002/..
?
3
Model for elimination of lifetime-limiting carbon vacancy d..:
Zechner, Christoph
;
Tanaka, Masahiro
;
Shimai, Kenji
...
Journal of Applied Physics. 132 (2022) 3 - p. , 2022
Link:
https://doi.org/10.1063/..
?
4
(Invited) Issues with n-type Dopants in Germanium:
Skarlatos, Dimitrios
;
Ioannou-Sougleridis, Vassilios
;
Barozzi, Mario
...
ECS Transactions. 86 (2018) 10 - p. 51-58 , 2018
Link:
https://doi.org/10.1149/..
?
5
Multiscale modeling of doping processes in advanced semicon..:
Zographos, Nikolas
;
Zechner, Christoph
;
Martin-Bragado, Ignacio
..
Materials Science in Semiconductor Processing. 62 (2017) - p. 49-61 , 2017
Link:
https://doi.org/10.1016/..
?
6
Silicon germanium interdiffusion in SiGe device fabrication..:
Zechner, Christoph
;
Zographos, Nikolas
Materials Science in Semiconductor Processing. 42 (2016) - p. 230-234 , 2016
Link:
https://doi.org/10.1016/..
?
7
E-MRS Spring Meeting 2015 Symposium Z: Nanomaterials and pr..:
Napolitani, Enrico
;
Duffy, Ray
;
Zographos, Nikolas
.
Materials Science in Semiconductor Processing. 42 (2016) - p. 165 , 2016
Link:
https://doi.org/10.1016/..
?
8
Atomistic modelling and simulation of arsenic diffusion inc..:
Martin‐Bragado, Ignacio
;
Zographos, Nikolas
;
Castrillo, Pedro
physica status solidi (a). 211 (2013) 1 - p. 147-151 , 2013
Link:
https://doi.org/10.1002/..
?
9
Process modeling of stress and chemical effects in SiGe all..:
Zographos, Nikolas
;
Martin-Bragado, Ignacio
Journal of Computational Electronics. 13 (2013) 1 - p. 59-69 , 2013
Link:
https://doi.org/10.1007/..
?
10
Process simulation of dopant diffusion and activation in ge..:
Zographos, Nikolas
;
Erlebach, Axel
physica status solidi (a). 211 (2013) 1 - p. 143-146 , 2013
Link:
https://doi.org/10.1002/..
?
11
Indirect boron diffusion in amorphous silicon modeled by ki..:
Martin-Bragado, Ignacio
;
Zographos, Nikolas
Solid-State Electronics. 55 (2011) 1 - p. 25-28 , 2011
Link:
https://doi.org/10.1016/..
?
12
Simulation of dopant diffusion and activation during flash ..:
Zechner, Christoph
;
Matveev, Dmitri
;
Zographos, Nikolas
..
Materials Science and Engineering: B. 154-155 (2008) - p. 20-23 , 2008
Link:
https://doi.org/10.1016/..
?
13
From point defects to dislocation loops: A comprehensive mo..:
Martin-Bragado, Ignacio
;
Avci, Ibrahim
;
Zographos, Nikolas
..
Solid-State Electronics. 52 (2008) 9 - p. 1430-1436 , 2008
Link:
https://doi.org/10.1016/..
?
14
Long and double hop kinetic Monte Carlo: Techniques to spee..:
Martin-Bragado, Ignacio
;
Zographos, Nikolas
;
Jaraiz, Martin
Materials Science and Engineering: B. 154-155 (2008) - p. 202-206 , 2008
Link:
https://doi.org/10.1016/..
?
15
Ab initio calculations of phosphorus and arsenic clustering..:
Sahli, Beat
;
Vollenweider, Kilian
;
Zographos, Nikolas
.
Materials Science and Engineering: B. 154-155 (2008) - p. 193-197 , 2008
Link:
https://doi.org/10.1016/..
1-15