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IC mask design
essential layout techniques McGraw-Hill professional engineering
Saint, Christopher
;
Saint, Judy
, c 2002
Exemplar:
Zentrale:Magazinturm E02
a elt 698 e/746
RT Book, Whole T1 <Title>IC mask design</Title> : <SubTitle>essential layout techniques</SubTitle> UL https://suche.suub.uni-bremen.de/peid=B34744392&Exemplar=1&LAN=DE A1 Saint, Christopher A1 Saint, Judy PB McGraw-Hill PP New York, NY [u.a.] YR 2002 NO XVIII, 457 S. ; 24 cm : Ill., graph. Darst. T3 McGraw-Hill professional engineering SN 0071389962 SN 9780071389969 LK http://katalog.suub.uni-bremen.de/DB=1/LNG=DU/CMD?ACT=SRCHA&IKT=8000&TRM=1219962821* CN Magazinturm E02: a elt 698 e/746 SF ELIB - SuUB Bremen
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