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Process-induced skew variation for scaled 2-D and 3-D ICs:

, In: Proceedings of the 12th ACM/IEEE international workshop on System level interconnect prediction,
Xu, Hu ; Pavlidis, Vasilis F. ; De Micheli, Giovanni - p. 17-24 , 2010
Link: https://dl.acm.org/doi/10.1145/1811100.1811107