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1 Ergebnisse
1
Simultaneous EUV Flare Variation Minimization and CMP Contr..:
, In:
Proceedings of the 51st Annual Design Automation Conference
,
Liu, Chi-Yuan
;
Chiang, Hui-Ju Katherine
;
Chang, Yao-Wen
. - p. 1-6 , 2014
Link:
https://dl.acm.org/doi/10.1145/2593069.2593215
RT T1
Proceedings of the 51st Annual Design Automation Conference
: T1
Simultaneous EUV Flare Variation Minimization and CMP Control with Coupling-Aware Dummification
UL https://suche.suub.uni-bremen.de/peid=acm-2593215&Exemplar=1&LAN=DE A1 Liu, Chi-Yuan A1 Chiang, Hui-Ju Katherine A1 Chang, Yao-Wen A1 Jiang, Jie-Hong R. PB ACM YR 2014 K1 Chemical Mechanical Polishing (CMP) K1 Dummification K1 Extreme Ultraviolet Lithography (EUVL) K1 Flare K1 Manufacturability K1 Hardware K1 Electronic design automation K1 Physical design (EDA) SP 1 OP 6 LK http://dx.doi.org/https://dl.acm.org/doi/10.1145/2593069.2593215 DO https://dl.acm.org/doi/10.1145/2593069.2593215 SF ELIB - SuUB Bremen
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