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1 Ergebnisse
1
Generic lithography modeling with dual-band optics-inspired..:
, In:
Proceedings of the 59th ACM/IEEE Design Automation Conference
,
Yang, Haoyu
;
Li, Zongyi
;
Sastry, Kumara
... - p. 973-978 , 2022
Link:
https://dl.acm.org/doi/10.1145/3489517.3530580
RT T1 <cTitle>Proceedings of the 59th ACM/IEEE Design Automation Conference</cTitle>: T1 <Title>Generic lithography modeling with dual-band optics-inspired neural networks</Title> UL https://suche.suub.uni-bremen.de/peid=acm-3530580&Exemplar=1&LAN=DE A1 Yang, Haoyu A1 Li, Zongyi A1 Sastry, Kumara A1 Mukhopadhyay, Saumyadip A1 Kilgard, Mark A1 Anandkumar, Anima A1 Khailany, Brucek A1 Singh, Vivek A1 Ren, Haoxing PB ACM YR 2022 K1 Computing methodologies K1 Hardware K1 Modeling and simulation K1 Electronic design automation K1 Hardware validation K1 Emerging technologies SP 973 OP 978 LK http://dx.doi.org/https://dl.acm.org/doi/10.1145/3489517.3530580 DO https://dl.acm.org/doi/10.1145/3489517.3530580 SF ELIB - SuUB Bremen
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