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The Nitrogen concentration effect on Ce doped SiOxNy emissi..:

Ehré, F ; Labbé, C ; Dufour, C...
info:eu-repo/semantics/altIdentifier/arxiv/1801.08795. , 2018

RT Journal
T1 <Title>The Nitrogen concentration effect on Ce doped SiOxNy emission: towards optimized Ce3+ for DEL applications</Title>

UL https://suche.suub.uni-bremen.de/peid=base-ftanrparis:oai:HAL:hal-01693044v2&Exemplar=1&LAN=DE
				
A1 Ehré, F
A1 Labbé, C
A1 Dufour, C
A1 Jadwisienczak, W, M
A1 Weimmerskirch-Aubatin, J
A1 Portier, X
A1 Doualan, J.-L
A1 Cardin, J
A1 Richard, A., L
A1 Ingram, D, C
A1 Labrugère, C
A1 Gourbilleau, F
PB HAL CCSD; Royal Society of Chemistry
YR 2018
K1 nephelauxetic effect
K1 silicon oxynitride
K1 thin films
K1 cerium
K1 photoluminescence
K1 [CHIM.MATE]Chemical Sciences/Material chemistry
K1 [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
K1 [PHYS.PHYS.PHYS-COMP-PH]Physics [physics]/Physics [physics]/Computational Physics [physics.comp-ph]
K1 [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]
K1 [SPI.ELEC]Engineering Sciences [physics]/Electromagnetism
K1 [SPI.MAT]Engineering Sciences [physics]/Materials
K1 [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
K1 [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic
JF info:eu-repo/semantics/altIdentifier/arxiv/1801.08795
LK http://dx.doi.org/https://hal.science/hal-01693044
DO https://hal.science/hal-01693044
SF ELIB - SuUB Bremen

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