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Chemical Bath Deposition of α-GaOOH with Tunable Morphology..:
Hector, Guislain
;
Appert, Estelle
;
Roussel, Herve
..
info:eu-repo/semantics/altIdentifier/doi/10.1021/acs.inorgchem.3c00397. , 2023
Link:
https://hal.science/hal-04104421
RT Journal T1 <Title>Chemical Bath Deposition of α-GaOOH with Tunable Morphology on Silicon Using the pH Adjustment</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftanrparis:oai:HAL:hal-04104421v1&Exemplar=1&LAN=DE A1 Hector, Guislain A1 Appert, Estelle A1 Roussel, Herve A1 Gélard, Isabelle A1 Consonni, Vincent PB HAL CCSD; American Chemical Society YR 2023 K1 GaOOH K1 Chemical Bath Deposition K1 Nanorods K1 [CHIM.MATE]Chemical Sciences/Material chemistry K1 [CHIM.INOR]Chemical Sciences/Inorganic chemistry JF info:eu-repo/semantics/altIdentifier/doi/10.1021/acs.inorgchem.3c00397 LK http://dx.doi.org/https://hal.science/hal-04104421 DO https://hal.science/hal-04104421 SF ELIB - SuUB Bremen
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