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1 Ergebnisse
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Water-soluble bio-sourced resists for DUV lithography in a ..:
Servin, Isabelle
;
Teolis, Alexandre
;
Bazin, Arnaud
...
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.mne.2023.100202. , 2023
Link:
https://hal.science/hal-04265241
RT Journal T1 <Title>Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment</Title> UL https://suche.suub.uni-bremen.de/peid=base-ftanrparis:oai:HAL:hal-04265241v1&Exemplar=1&LAN=DE A1 Servin, Isabelle A1 Teolis, Alexandre A1 Bazin, Arnaud A1 Durin, Paule A1 Sysova, Olha A1 Gablin, Corinne A1 Saudet, Benoît A1 Leonard, Didier A1 Soppera, Olivier A1 Leclercq, Jean -Louis A1 Chevolot, Yann A1 Tiron, Raluca A1 Delair, Thierry A1 Trombotto, Stéphane PB HAL CCSD; Elsevier YR 2023 K1 Lithography K1 photoresist K1 chitosan K1 water-based K1 semiconductor K1 industrial pre-transfer K1 sustainability K1 [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics K1 [CHIM.POLY]Chemical Sciences/Polymers JF info:eu-repo/semantics/altIdentifier/doi/10.1016/j.mne.2023.100202 LK http://dx.doi.org/https://hal.science/hal-04265241 DO https://hal.science/hal-04265241 SF ELIB - SuUB Bremen
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