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1 Ergebnisse
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Interface properties of SiOxNy layer on Si prepared by atmo..:
Zhuo, Zeteng
;
Sannomiya, Yuta
;
Kanetani, Yuki
...
http://www.nanoscalereslett.com/content/8/1/201. , 2013
Link:
http://www.nanoscalereslett.com/content/8/1/201
RT Journal T1
Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation
UL https://suche.suub.uni-bremen.de/peid=base-ftbiomed:oai:biomedcentral.com:1556-276X-8-201&Exemplar=1&LAN=DE A1 Zhuo, Zeteng A1 Sannomiya, Yuta A1 Kanetani, Yuki A1 Yamada, Takahiro A1 Ohmi, Hiromasa A1 Kakiuchi, Hiroaki A1 Yasutake, Kiyoshi PB BioMed Central Ltd. YR 2013 K1 SiOxNy film K1 Interface properties K1 Interface state density K1 Atmospheric-pressure plasma K1 Plasma oxidation-nitridation JF http://www.nanoscalereslett.com/content/8/1/201 LK http://www.nanoscalereslett.com/content/8/1/201 DO http://www.nanoscalereslett.com/content/8/1/201 SF ELIB - SuUB Bremen
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