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1 Ergebnisse
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Process Variability—Technological Challenge and Design Issu..:
Lorenz, Jürgen
;
Bär, Eberhard
;
Barraud, Sylvain
...
info:eu-repo/semantics/altIdentifier/doi/10.3390/mi10010006. , 2019
Link:
https://hal-cea.archives-ouvertes.fr/cea-02965982
RT Journal T1
Process Variability—Technological Challenge and Design Issue for Nanoscale Devices
UL https://suche.suub.uni-bremen.de/peid=base-ftccsdartic:oai:HAL:cea-02965982v1&Exemplar=1&LAN=DE A1 Lorenz, Jürgen A1 Bär, Eberhard A1 Barraud, Sylvain A1 Brown, Andrew A1 Evanschitzky, Peter A1 Klüpfel, Fabian A1 Wang, Liping PB HAL CCSD; MDPI YR 2019 K1 process simulation K1 device simulation K1 compact models K1 process variations K1 systematic variations K1 statistical variations K1 FinFETs K1 nanowires K1 nanosheets K1 [SPI]Engineering Sciences [physics] JF info:eu-repo/semantics/altIdentifier/doi/10.3390/mi10010006 LK http://dx.doi.org/https://hal-cea.archives-ouvertes.fr/cea-02965982 DO https://hal-cea.archives-ouvertes.fr/cea-02965982 SF ELIB - SuUB Bremen
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