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Thermal expansion and stress development in the first stage..:
Chenevier, Bernard
;
Chaix-Pluchery, Odette
;
Gergaud, Patrice
..
info:eu-repo/semantics/altIdentifier/doi/10.1063/1.1625092. , 2003
Link:
https://hal.archives-ouvertes.fr/hal-00207862
RT Journal T1
Thermal expansion and stress development in the first stages of silicidation in Ti/Si thin films
UL https://suche.suub.uni-bremen.de/peid=base-ftccsdartic:oai:HAL:hal-00207862v1&Exemplar=1&LAN=DE A1 Chenevier, Bernard A1 Chaix-Pluchery, Odette A1 Gergaud, Patrice A1 Thomas, Olivier A1 La Via, Francesco PB HAL CCSD; American Institute of Physics YR 2003 K1 Ti/Si thin films K1 in-situ X-ray diffraction K1 silicidation K1 Si diffusion K1 stress/strain analysis K1 [CHIM.MATE]Chemical Sciences/Material chemistry JF info:eu-repo/semantics/altIdentifier/doi/10.1063/1.1625092 LK http://dx.doi.org/https://hal.archives-ouvertes.fr/hal-00207862 DO https://hal.archives-ouvertes.fr/hal-00207862 SF ELIB - SuUB Bremen
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