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1 Ergebnisse
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Critical Level of Nitrogen Incorporation in Silicon Oxynitr..:
Topka, Konstantina
;
Diallo, Babacar
;
Puyo, Maxime
...
info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaelm.2c00018. , 2022
Link:
https://hal.science/hal-03657402
RT Journal T1
Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance
UL https://suche.suub.uni-bremen.de/peid=base-ftccsdartic:oai:HAL:hal-03657402v1&Exemplar=1&LAN=DE A1 Topka, Konstantina A1 Diallo, Babacar A1 Puyo, Maxime A1 Papavasileiou, Paris A1 Lebesgue, Charlotte A1 Genevois, Cecile A1 Tison, Yann A1 Charvillat, Cedric A1 Samelor, Diane A1 Laloo, Raphael A1 Sadowski, Daniel A1 Senocq, François A1 Sauvage, Thierry A1 Vergnes, Hugues A1 Menu, Marie-Joelle A1 Caussat, Brigitte A1 Turq, Viviane A1 Pellerin, Nadia A1 Vahlas, Constantin PB HAL CCSD; American Chemical Society YR 2022 K1 silicon oxynitride K1 tris(dimethylsilyl)amine K1 chemical vapor deposition K1 buffer oxide etchant K1 hydrolysis resistance K1 thin film K1 material network K1 wet etching corrosion K1 [CHIM.MATE]Chemical Sciences/Material chemistry JF info:eu-repo/semantics/altIdentifier/doi/10.1021/acsaelm.2c00018 LK http://dx.doi.org/https://hal.science/hal-03657402 DO https://hal.science/hal-03657402 SF ELIB - SuUB Bremen
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